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Plasma and surface modeling of the deposition of hydrogenated carbon films from low-pressure methane plasmas

  • Plasma-Enhanced Chemical Vapor Deposition
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Abstract

The elementary mechanisms are described which determine the plasma and surface processes during the plasma-enhanced chemical vapour deposition of hydrogenated carbon films from methane. Corresponding model calculations are reviewed and critically discussed in comparison to experimental results. A realistic modeling requires the simultaneous and self-consistent treatment of plasma and surface effects. Several experimental data sets on plasma parameters and the growth and the composition of the films have been reproduced successfully. However, a broader experimental data base is needed for more critical tests of the models. The reliability of the modeling, in particular of the surface effects, is still limited due to the poor availability of elementary data.

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  1. Max-Planck-Institut für Plasmaphysik, EURATOM-Association, W-8046, Garching, Germany

    W. Möller

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Möller, W. Plasma and surface modeling of the deposition of hydrogenated carbon films from low-pressure methane plasmas. Appl. Phys. A 56, 527–546 (1993). https://doi.org/10.1007/BF00331402

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