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Tetrachlorosilane Consumption in Radio Frequency Glow Discharge

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Abstract

Time-resolved mass spectrometry was used for analysis of the plasma reactions in radio frequency (RF) SiCl 4 and SiCl 4 −O 2 discharges as functions of starting partial pressure and electrical power. Molecular concentrations of the reactants and products from SiCl 4 alone and with O 2 were obtained from the mass spectra and used for plotting the kinetic curves. The SiCl 4 and O 2 consumption rates were calculated from the kinetic curves and compared with results of theoretical simulation of the reaction. Direct electron impact decomposition was found to be the main pathway for pure SiCl 4 conversion. On the contrary, the consumption of SiCl 4 in the SiCl 4 +O 2 mixtures was largely chemical. The experimental macrokinetics are in agreement with a model in which oxidation is caused by the atomic oxygen.

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Authors and Affiliations

  1. Department of General and Laser Physics, Technical University of Samara, 141 Galaktionovskaya St., Samara, 443010, Russia

    L. M. Blinov, A. G. Golovkin, L. I. Kaganov, V. B. Oparin, A. A. Razhavski, A. M. Shterenberg, V. V. Volodko & V. I. Zyn

Authors
  1. L. M. Blinov
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  2. A. G. Golovkin
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  3. L. I. Kaganov
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  4. V. B. Oparin
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  5. A. A. Razhavski
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  6. A. M. Shterenberg
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  7. V. V. Volodko
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  8. V. I. Zyn
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Blinov, L.M., Golovkin, A.G., Kaganov, L.I. et al. Tetrachlorosilane Consumption in Radio Frequency Glow Discharge. Plasma Chemistry and Plasma Processing 18, 509–533 (1998). https://doi.org/10.1023/A:1021811316740

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  • DOI: https://doi.org/10.1023/A:1021811316740

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