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The effect of Y-ion implantation on the oxidation of β-NiAl

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Abstract

The influence of Y-ion implantation on the oxidation of β-NiAl single crystals has been investigated using SEM, TEM, and STEM. Y ions having an energy of 70 keV were implanted with a concentration of 5×1016 ions/cm2. The oxidation experiments were performed in air at 1223 K. Y-ion implantation resulted in a 45-nm disordered layer. Oxidation of Y-implanted β-NiAl leads to the formation of a fine-grain layer, consisting of γ-Al2O3 containing Y and a θ-Al2O3 layer. After further oxidation the metastable Al2O3 transformed into α-Al2O3, which started at the metal-oxide interface. Y-Al-garnet (YAG) particles were observed and Y segregation to α-Al2O3 grain boundaries has been detected.

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References

  1. J. Jedlinski,Sol. State Phenom. 21, 335 (1992).

    Google Scholar 

  2. K. Przybylski and G. J. Yurek,Mater. Sci. Forum 43, 1 (1989).

    Google Scholar 

  3. B. A. Pint, A. J. Garatt-Reed, and L. W. Hobbs, Proc. 2nd Int. Conf. Microscopy of Oxidation, 1993 p. 463.

  4. B. Lesage, M. L. Gall, M. K. Loudjani, and A. M. Huntz,Defect Diffusion forum 95–98, 1061 (1993).

    Google Scholar 

  5. H. J. Grabke, D. Wiemer, and H. Viefhaus,Appl. Surf. Sci. 47, 243 (1991).

    Google Scholar 

  6. M. W. Brumm and H. J. Grabke,Corros. Sci. 33, 1677 (1992).

    Google Scholar 

  7. P. Fox, D. G. Lees, and G. W. Lorimer,Oxid. Met. 36, 491 (1991).

    Google Scholar 

  8. A. B. Anderson, S. P. Mehandru and J. L. Smialek,J. Electrochem. Soc. 132, 1695 (1985)

    Google Scholar 

  9. S. Y. Hong, A. B. Anderson, and J. L. Smialek,Surf. Sci. 230, 175 (1990).

    Google Scholar 

  10. E. W. A. Young and J. H. W. deWit,Oxid. Met. 26, 351 (1986).

    Google Scholar 

  11. J. Jedlinski and G. Borchardt,Oxid. Met. 36, 317 (1991).

    Google Scholar 

  12. B. A. Pint, J. R. Martin, and L. W. Hobbs,Oxid. Met. 39, 167 (1993).

    Google Scholar 

  13. R. Prescott, D. F. Mitchell, and M. J. Graham, Proc. 2nd Int. Conf. Microscopy of Oxidation, 1993, p. 455.

  14. D. T. Jayne and J. L. Smialek, Proc. 2nd Int. Conf. Microscopy of Oxidation, 1993, p. 183.

  15. M. Siegers, H. J. Grabke, and H. Viefhaus, Proc. 2nd Int. Conf. Microscopy of Oxidation, 1993, p. 269.

  16. K. Przybylski, A. J. Garatt-Reed, B. A. Pint, and G. J. Yurek,J. Electrochem. Soc. 134, 3207 (1987).

    Google Scholar 

  17. Y. K. Kim, K. Przybylski, and G. J. Yurek,Proc. Electrochem. Soc. 9, 259 (1986).

    Google Scholar 

  18. J. Doychak, J. L. Smialek, and T. E. Mitchell,Met. Trans. A 20, 499 (1989).

    Google Scholar 

  19. J. Doychak and M. Rühle,Oxid. Met. 31, 431 (1989a).

    Google Scholar 

  20. K. Prüßner, J. Bruley, U. Salzberger, H. Zweygart, E. Schumann, and M. Rühle, Proc. 2nd Int. Conf. Microscopy of Oxidation, 1993, p. 435.

  21. A. Strecker, U. Salzberger, and J. Mayer,Practical Metall. 30, 482 (1993).

    Google Scholar 

  22. G. Yamaguchi, I. Yasui, and W. C. Chiu,Bull. Chem. Soc. J. 43, 2487 (1970).

    Google Scholar 

  23. JCPDS, Powder Diffraction File: card No.: 29-63, 1990.

  24. B. A. Pint, A. Jain, and L. W. Hobbs, Mater. Res. Soc. Proc.213, 981 (1991).

    Google Scholar 

  25. B. A. Pint, A. Jain, and L. W. Hobbs, Mater. Res. Soc. Symp. Proc.288, 1013 (1993).

    Google Scholar 

  26. B. A. Pint and L. W. Hobbs,Electrochem. Soc. Extended Abstracts 93, 1711 (1993).

    Google Scholar 

  27. P. Y. Hou and J. Stringer,Oxid. Met. 29, 45 (1988).

    Google Scholar 

  28. J. M. Hampikian and D. I. Potter,Oxid. Met. 38, 125 (1992).

    Google Scholar 

  29. G. C. Rybicki and J. L. Smialek,Oxid. Met. 31, 275 (1989).

    Google Scholar 

  30. C. Wagner,J. Electrochem. Soc. 103, 571 (1956).

    Google Scholar 

  31. D. P. Whittle and D. J. Young,Oxid. Met. 123, 1073 (1976).

    Google Scholar 

  32. M. Bobeth, W. Pompe, M. Rockstroh, and E. Schumann,Acta Metall. Mater. 42, 579 (1994).

    Google Scholar 

  33. R. L. Tallman and E. A. Gulbransen,J. Electrochem. Soc. 115, 770 (1968).

    Google Scholar 

  34. L. C. Dufour and F. Morin,Oxid. Met. 39, 137 (1993).

    Google Scholar 

  35. J. Doychak, Doctoral thesis, Case Western Reserve University, Cleveland, OH (1986).

  36. E. Schumann, G. Schnotz, K. P. Trumble, and M. Rühle,Acta Metall. Mater. 40, 1311 (1992).

    Google Scholar 

  37. W. J. Quadakkers, J. Jedlinski, K. Schmidt, M. Krasovec, G. Borchardt, and H. Nickel,Appl. Surface Sci. 47, 261 (1991).

    Google Scholar 

  38. M. W. Brumm and H. J. Grabke,Corros. Sci. 34, 547 (1993).

    Google Scholar 

  39. J. D. Kuenzly and D. L. Douglass,Oxid. Met. 8, 139 (1974).

    Google Scholar 

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Schumann, E. The effect of Y-ion implantation on the oxidation of β-NiAl. Oxid Met 43, 157–172 (1995). https://doi.org/10.1007/BF01046752

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