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Thin metal oxide films on transparent substrates for Li-insertion devices

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Abstract

Lithium insertion in metal oxides is a process of interest in many electrochemical applications, including rechargeable batteries and electrochromic displays. In this work we have examined the characteristics of this process in a series of oxides prepared in the thin-film configuration. The lithium insertion process has been examined in WO3, NiO, V2O5, Nb2O5 and tin-doped indium oxide (ITO) thin film electrodes deposited on transparent substrates. We have considered various aspects of the insertion process in these oxides with particular attention to charge capacity, reversibility, kinetics, structural and optical changes. The results suggest that the process may induce irreversible modifications in some of the host structures. However, under certain well defined conditions, the process occurs reversibly and thus some of the studied oxides may find successful application in electrochemical devices of prime technological interest.

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Author notes

  1. J. Scarminio

    Present address: Dep. de Fisica, Univ. Est. de Londrina, Londrina PR, Brasil

Authors and Affiliations

  1. Chemistry Department, University “La Sapienza”, Roma, Italy

    S. Passerini, J. Scarminio, B. Scrosati, D. Zane & F. Decker

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  1. S. Passerini
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  3. B. Scrosati
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  4. D. Zane
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  5. F. Decker
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Passerini, S., Scarminio, J., Scrosati, B. et al. Thin metal oxide films on transparent substrates for Li-insertion devices. J Appl Electrochem 23, 1187–1195 (1993). https://doi.org/10.1007/BF00625594

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  • DOI: https://doi.org/10.1007/BF00625594

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