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The induction plasma chemical reactor: Part I. Equilibrium model

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Abstract

A mathematical model is presented for the numerical simulation of the flow, temperature, and concentration fields in an rf plasma chemical reactor. The simulation is performed assuming chemical equilibrium. The extent of validity of this assumption is discussed. The system considered is the reaction of SiCl4 and NH3 for the production of Si3N4.

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Authors and Affiliations

  1. Institute of Mechanics, Chinese Academy of Sciences, Beijing, People's Republic of China

    G. Y. Zhao

  2. Department of Chemical Engineering, Université de Sherbrooke, J1K 2R1, Sherbrooke, Québec, Canada

    J. Mostaghimi & M. I. Boulos

Authors
  1. G. Y. Zhao
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  2. J. Mostaghimi
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  3. M. I. Boulos
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Zhao, G.Y., Mostaghimi, J. & Boulos, M.I. The induction plasma chemical reactor: Part I. Equilibrium model. Plasma Chem Plasma Process 10, 133–150 (1990). https://doi.org/10.1007/BF01460452

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  • DOI: https://doi.org/10.1007/BF01460452

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