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Microhardness of (Ti,Al)N films deposited by reactive R.F. magnetron sputtering

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Journal of Materials Science Letters

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References

  1. H. FRELLER and H. FIAESSLER, Surf. Coatings Technol. 36 (1988) 219.

    Google Scholar 

  2. C. T. HUANG and J. G. DUB, Surf. Coatings Technol. 56 (1992) 51.

    Google Scholar 

  3. J. U. DUH and C. T. HUANG, Surf. Coatings Technol. 56 (1992) 61.

    Google Scholar 

  4. C. T. HUANG and J. G. DUH, Surf. Coatings Technol. 71 (1995) 259.

    Google Scholar 

  5. P. J. BURNETT and D. S. RICKERBY, Thin Solid Films 148 (1987) 41.

    Google Scholar 

  6. H. LI and R. C. BRADT, J. Hard Mater. 3 (1992) 403.

    Google Scholar 

  7. S. J. BULL and D.S. RICKERBY, in "Advanced Surface Coatings", edited by D. S. Rickerby and A. Matthews (Blackie & Son Ltd., London, 1991) p. 315.

    Google Scholar 

  8. B. JONSSON and S. HOGMARK, Thin Solid Films 114 (1984) 257–269.

    Google Scholar 

  9. O. KNOTEK, M. BOHMER, T, LEYENDECKER and F. JUNGBLUT, Mater. Sci. Eng. A105/106 (1988) 481.

    Google Scholar 

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Huang, CT., Duh, JG. Microhardness of (Ti,Al)N films deposited by reactive R.F. magnetron sputtering. Journal of Materials Science Letters 16, 59–61 (1997). https://doi.org/10.1023/A:1018548717316

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