Skip to main content
Log in

High-temperature thermal evolution of SiAs precipitates in silicon

  • Solids And Materials
  • Published:
Applied Physics A Aims and scope Submit manuscript

Abstract

The thermal evolution of monoclinic SiAs precipitates at 1050° C in silicon samples implanted with 1 and 1.5×1017 As/cm2 was followed by transmission electron microscopy (TEM) and secondary neutral mass spectrometry (SNMS). These experiments show, for the first time, the coexistence of two different states of As in silicon, i.e., the electrically active and the inactive mobile dopant, in equilibrium with monoclinic SiAs precipitates. Moreover, they provide, for the saturation concentration of As in silicon, which includes both these states, a value of 3×1021 cm−3 at 1050° C.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Similar content being viewed by others

References

  1. A. Armigliato, A. Parisini: J. Mat. Res. 6, 1701 (1991)

    Google Scholar 

  2. T. Wadsten: Acta Chem. Scand. 23, 331 (1969)

    Google Scholar 

  3. R. Jede, H. Peters, G. Ganschow, U. Kaiser, K. Seifert: J. Vac. Sci. Technol. A 6, 2271 (1988)

    Google Scholar 

  4. A. Lietoila, J.F. Gibbons, T.W. Sigmon: Appl. Phys. Lett. 36, 9 (1980)

    Google Scholar 

  5. D. Nobili, A. Carabelas, G. Celotti, S. Solmi: J. Electrochem. Soc. 130, 992 (1983)

    Google Scholar 

  6. M. Derdour, D. Nobili, S. Solmi: J. Electrochem. Soc. 138, 858 (1991)

    Google Scholar 

  7. S.M. Hu: In Atomic Diffusion in Semiconductors, ed. by D. Shaw (Plenum, London 1973) p. 217

    Google Scholar 

  8. R.B. Fair, G.R. Weber: J. Appl. Phys. 44, 273 (1973)

    Google Scholar 

  9. M.Y. Tsai, F.F. Morehead, J.E.E. Baglin, A.E. Michel: J. Appl. Phys. 51, 3230 (1980)

    Google Scholar 

  10. E. Guerrero, H. Potzl, R. Tielert, M. Grasserbauer, G. Stingeder: J. Electrochem. Soc. 129, 1286 (1982)

    Google Scholar 

  11. K.C. Pandey, A. Erbil, G.S. Cargill III, R.F. Boehme, D. Vanderbilt: Phys. Rev. Lett. 61, 1282 (1988)

    Google Scholar 

  12. A. Parisini, A. Bourret, A. Armigliato, M. Servidori, S. Solmi, R. Fabbri, J.R. Regnard, J.L. Allain: J. Appl. Phys. 67, 2320 (1990)

    Google Scholar 

  13. P.M. Fahey, P.B. Griffin, J.D. Plummer: Rev. Mod. Phys. 61, 2 (1989)

    Google Scholar 

  14. A. Armigliato, D. Nobili, S. Solmi, A. Bourret, P. Werner: J. Electrochem. Soc. 133, 2560 (1986)

    Google Scholar 

  15. D. Nobili: In Semiconductor Silicon, ed. by H.R. Huff, K.G. Barraclough, Jun-ichi Chikawa (The Electrochemical Soc. Inc., Princeton, NJ 1990) p. 550

    Google Scholar 

  16. A. Armigliato, A. Bourret, S. Frabboni, A. Parisini: Phys. Status Solidi (a) 109, 53 (1988)

    Google Scholar 

Download references

Author information

Authors and Affiliations

Authors

Rights and permissions

Reprints and permissions

About this article

Cite this article

Parisini, A., Nobili, D., Armigliato, A. et al. High-temperature thermal evolution of SiAs precipitates in silicon. Appl. Phys. A 54, 221–224 (1992). https://doi.org/10.1007/BF00323840

Download citation

  • Received:

  • Accepted:

  • Issue Date:

  • DOI: https://doi.org/10.1007/BF00323840

PACS

Navigation