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  • 1
    Publication Date: 1966-06-01
    Print ISSN: 0044-2313
    Electronic ISSN: 1521-3749
    Topics: Chemistry and Pharmacology
    Published by Wiley
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  • 2
    Publication Date: 1978-06-01
    Print ISSN: 0044-2313
    Electronic ISSN: 1521-3749
    Topics: Chemistry and Pharmacology
    Published by Wiley
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  • 3
    Publication Date: 1972-11-01
    Print ISSN: 0044-2313
    Electronic ISSN: 1521-3749
    Topics: Chemistry and Pharmacology
    Published by Wiley
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  • 4
    ISSN: 1432-0630
    Keywords: PACS: 61.80.Fe; 61.82.Fk; 84.60.Jt
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract. We investigate the degradation of ZnO/CdS/ Cu(In,Ga)Se2 heterojunction solar cells for space applications and the defect generation in polycrystalline Cu(In,Ga)Se2 thin films by irradiation with 1-MeV electrons with fluences φe up to φe=5×1018 cm-2. Notable degradation of the solar cell performance starts at fluences of φe=1017 cm-2 where the open circuit voltage decreases by about 5% while short circuit current and fill factor remain essentially unaffected. Thus, Cu(In,Ga)Se2 solar cells withstand electron fluences which are higher by one order of magnitude or more when compared to other technologies. A model describes the absolute open circuit voltage loss considering the increase of space charge recombination by electron irradiation-induced defects. Defect analysis by admittance spectroscopy shows that acceptor defects with an energy distance of approximately 300 meV from the valence band are generated at a rate γ=0.017 (±0.01) cm-1.
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  • 5
    Electronic Resource
    Electronic Resource
    Weinheim : Wiley-Blackwell
    Zeitschrift für anorganische Chemie 441 (1978), S. 125-164 
    ISSN: 0044-2313
    Keywords: Chemistry ; Inorganic Chemistry
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology
    Description / Table of Contents: Formation of Organosilicon Compounds. 72. The Reactivity of Carbosilanes and their C-Chlorinated Derivatives in Reactions with CH3MgCl and LiCH3Reactions of (H3Si—CH2)2SiH2 1, (H2Si—CH2)3 2, (H3Si)2CCl2 3, (H3Si)2CHCl 4, H3Si—CCl2—SiH2-CH2-SiH3 5, and (H3Si—CCl2)2SiH2 6 as well as H3SiCH2Cl, H3SiCHCl2, and H3SiCCl3 with meMgCl and Lime (me = CH3) respectively are reported. In 1 and 2 by using tetrahydrofurane (THF) as a solvent, methylation to a higher degree is possible. The C-chlorination increases the activation of the Si—H group. Reactions of the C-chlorinated compounds result in Si—H substitution (maintaining of molecular frame), in cleavage and enlargement of the molecular frame and in transformation of CCl2 group into CHCl and CH2 groups respectively. Reactions with meMgCl in THF and with Lime in diethylether (Et2O) favour the cleavage of the molecular and the hydrogenation of the CCl2 group. The methylation of compound 5 occures on the Si—H groups neighbouring the CCl2 groups. The reactivity of these Si—H groups is decreased by increasing methylation. Reacting compound 6 with meMgCl in Et2O cleavage reations dominate. However, using cyclohexane as a solvent this cleavage reaction recedes in favour of the formation of 1,3,5-trisilapentane, containing a CCl2 group and a CHCl or a CH2 group. Thereby however, the methylation of only two SiH groups is observed. The 1H-, 29Si-, and 13C-n.m.r. data allow an assessment of progressing SiH-methylation within the homologous series.
    Notes: Es wird über Umsetzungen von (H3Si—CH2)2SiH2 1, (H2Si—CH2)3 2, (H3Si)2CCl2 3, (H3Si)2CHCl 4, H3Si—CCl2—SiH2—CH2-SiH3 5 und (H3Si—CCl2)2SiH2SiH2 6 sowie von H3Si—CH2Cl, H3Si—CHCl2, H3Si—CCl3 mit meMgCl bzw. Lime (me = CH3) berichtet. In 1 und 2 werden durch Verwendung von Tetrahydrofuran (THF) als Lösungsmittel höhere Methylierungsstufen ermöglicht. Die C-Chlorierung bewirkt eine Aktivierung der Si—H-Gruppe. Die C-chlorierten Verbindungen reagieren unter Si—H Substitution (Erhalt des Molekülgerüstes), unter Spaltungen und Vergrößerungen des Molekügerüstes und unter Hydrierung der CCl2-Gruppe zu der CHCl- bzw. CH2-Gruppe. Bei Umsetzungen mit meMgCl in THF oder mit Lime in Diäthyläther (Et2O) werden Reaktionen begünstigt, die unter Molekülspaltung und CCl2-Hydrierung ablaufen. In 5 beginnt die Methylierung an den der CCl2-Gruppe benachbarten SiH-Gruppen, deren Reaktionsfähigkeit mit steigendem Methylierungsgrad sinkt. Bei 6 bestimmen die Si—C-Spaltungen den Reaktionsablauf (Umsetzung mit meMgCl in Et2O), der aber durch Verwendung von Cyclohexan als Lösungsmittel zurückgedrängt wird zugunsten der Bildung von 1,3,5-Trisilapentanen mit einer CCl2- und einer CHCl- oder CH2-Gruppe, wobei aber nur maximal die Methylierung von zwei SiH-Gruppen erreicht wird. Die 1H-, 29Si- und 13C-NMR-Daten erlauben eine Abschätzung des Verlaufs der SiH-Methylierung innerhalb der homologen Reihen.
    Additional Material: 5 Ill.
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  • 6
    Electronic Resource
    Electronic Resource
    Weinheim : Wiley-Blackwell
    Materialwissenschaft und Werkstofftechnik 3 (1972), S. 263-264 
    ISSN: 0933-5137
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Description / Table of Contents: A simple Method for the Detection of soluble Auxiliary Agents containing Dimethylsilicone. Rapid detection of soluble dimethyl silicone compounds, occurring as residues of auxiliary agents or finishes on the surface of hardware, which in special cases may cause hazardous effects, can be achieved by a simple test. Since silicone compounds decrease the surface tension of trichloro-ethylene (TRI), shaking of such solutions produces foam. The stability of the foam depends on the silicone concentration from 10 μg silicone per ml TRI (detection limit) up to about 100 mg/ml TRI (saturation).
    Notes: Zum schnellen Nachweis löslicher Dimethylsilikonverbindungen, die auf Oberflächen von Bauteilen z. B. als Reste von Verarbeitungshilfsmitteln oder als Bestandteile von Lacken in bestimmten Fällen Ursache unerwünschter Effekte sein können, hat sich ein sog. „TRI-Schütteltest“ bewährt. Silikonverbindungen setzen die Oberflächenspannung von Trichloräthylen (TRI) herab, so daß beim Schütteln Schaum entsteht. Die Beständigkeit des Schaumes ist ein Maß für den Silikongehalt der Lösung zwischen 10 μg Silikon/ml TRI (Nachweisgrenze) und etwa 100 mg/ml TRI (Sättigung).
    Additional Material: 1 Ill.
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  • 7
    Electronic Resource
    Electronic Resource
    Weinheim : Wiley-Blackwell
    Zeitschrift für anorganische Chemie 345 (1966), S. 93-105 
    ISSN: 0044-2313
    Keywords: Chemistry ; Inorganic Chemistry
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology
    Description / Table of Contents: The preparation, structure, thermal decomposition and IR spectrum of (Me3Si)2NH → MCl3 (M = Al, Ga) and (Me3Si)3N → AlCl3 (Me = CH3) are reported. Attemps to prepare [(Me3Si)4N]+[SbF6]- are described. From the IR spectrum of (Me3Si)2NH → MCl3 the force constant of the Si—N single bond has been calculated to be 2.87 ± 0.13 mdyn/Å.
    Notes: Es werden Darstellung, Struktur, Thermolyse und Infrarotspektren der Ammoniumverbindungen (Me3Si)2NH → MCl3 (M = Al, Ga) und (Me3Si)3N → AlCl3 (Me = CH3) sowie Darstellungsversuche für [(Me3Si)4N]+[SbF6]- beschrieben. Als Ergebnis einer quantitativen Auswertung der Infrarotspektren im Falle der Verbindungen (Me3Si)2NH → MCl3 ließ sich die Kraftkonstante der Si—N-Einfachbindung zu 2.87 ± 0.13 mdyn/Å festlegen.
    Additional Material: 1 Ill.
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  • 8
    Electronic Resource
    Electronic Resource
    Weinheim : Wiley-Blackwell
    Zeitschrift für anorganische Chemie 394 (1972), S. 197-208 
    ISSN: 0044-2313
    Keywords: Chemistry ; Inorganic Chemistry
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology
    Description / Table of Contents: Beryllium dichloride, magnesium dihalide (hal = Cl, Br, J), boron trihalide (hal = F, Cl, Br) and aluminium trichloride are transformed by trimethylsilyl azide in methylen chloride and ether, respectively, to dimer beryllium chloride azide etherate, polymer beryllium diazide, polymer magnesium halide azide, trimer boron dihalide azide, monomer (in CH3Cl2) aluminium dichloride azide and polymer aluminium chloride diazide, respectively. Magnesium diazide and aluminium triazide are formed by azidation of magnesium diiodide and aluminium trichloride only in connection with magnesium iodide azide and aluminium chloride diazide, respectively. Unlike the covalent azides of beryllium, boron and (possibly) aluminium with α-azido brigdes, the azides of magnesium contain azide ions.
    Notes: Berylliumdichlorid, Magnesiumdihalogenid (Hal = Cl, Br, J), Bortrihalogenid (Hal = F, Cl, Br) bzw. Aluminiumtrichlorid lassen sich mit Trimethylsilylazid in Methylenchlorid bzw. Äther in dimeres Berylliumchloridazid-Ätherat, polymeres Berylliumdiazid, polymeres Magnesiumhalogenidazid, trimeres Bordihalogenidazid, monomeres (in CH2Cl2) Aluminiumdichloridazid bzw. polymeres Aluminiumchloriddiazid überführen. Magnesiumdiazid bzw. Aluminiumtriazid bilden sich durch Azidierung von Magnesiumdijodid bzw. Aluminiumtrichlorid nur im Gemisch mit Magnesiumjodidazid bzw. Aluminiumchloriddiazid. Zum Unterschied von den kovalent gebauten Aziden des Berylliums, Bors und (möglicherweise) Aluminiums mit α-Azidbrücken, enthalten die Azide des Magnesiums ionogen gebundenes Azid.
    Additional Material: 2 Tab.
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  • 9
    Electronic Resource
    Electronic Resource
    Weinheim : Wiley-Blackwell
    Zeitschrift für die chemische Industrie 76 (1964), S. 380-381 
    ISSN: 0044-8249
    Keywords: Chemistry ; General Chemistry
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    Weinheim : Wiley-Blackwell
    Zeitschrift für die chemische Industrie 77 (1965), S. 1042-1042 
    ISSN: 0044-8249
    Keywords: Chemistry ; General Chemistry
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology
    Type of Medium: Electronic Resource
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