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  • 11
    Electronic Resource
    Electronic Resource
    Oxford, UK : Blackwell Publishing Ltd
    Annals of public and cooperative economics 40 (1969), S. 0 
    ISSN: 1467-8292
    Source: Blackwell Publishing Journal Backfiles 1879-2005
    Topics: Economics
    Notes: Co-operatives in North America, developed to correct or off set real or imagined wrongs in the economic system within which agriculture over time became further involved, have remained largely rural. Where successful, co-operatives bridged the gap between a fundamentalist agricultural production industry that tended to look inwards to itself and a privately capitalised marketing industry that looked outwards towards metropolitan and overseas markets. In pioneer and pioneering environments where free enterprise agri-business became significantly involved in on-farm or on-ranch operations, co-operatives did not become im-portant as the services and attitudes of agri-business complemented rather than exploited the man on the land.In the more commercialised integrated agriculture of today, corporate agri-business has found an interest in greater involvement in farm operations: much of this comes from changes in technology that make off-farm purchases as important a component of the agricultural com-plex as off-farm sales of products. Thus, co-operatives have lost their unique “bridge” role, have problems themselves of identity and of their most desirable patterns of future development. But their competition-existing corporate agri-business and new entrants from the conglom-erate industrial giants-are not without their problems also. These are outlined as well as the issues co-operatives-and co-operative philosophers and promoters-must tackle if they are to remain successful market participants and have identifiable characteristics that reflect co- operative idealism. The unique member-client relationship the co-operative is based on should be exploited to maintain and expand these complementary and essential goals for continued farmers’business participation in the North American and world economies.
    Type of Medium: Electronic Resource
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  • 12
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 64 (1988), S. 5110-5116 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We report a detailed study using photoluminescence and photoluminescence excitation of metalorganic chemical vapor deposition GaAs grown directly on Si substrates. Temperature variation and selective excitation allow reliable assignment of spectral features. This assignment permits measurements of strain and strain uniformity, identification of impurities, and assessment of general material quality. In 2–5-μm-thick layers similar spectra are observed with little variation from substrate character. Near 4 K, most samples show one of the two split valence-band features plus defect recombination, always including carbon. Strain uniformity varies widely and correlates with substrate thickness. The range of spectra observed from a variety of samples and guidelines for interpretation of nonresonantly excited spectra are discussed.
    Type of Medium: Electronic Resource
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  • 13
    Electronic Resource
    Electronic Resource
    s.l. : American Chemical Society
    The @journal of physical chemistry 〈Washington, DC〉 90 (1986), S. 3393-3399 
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology , Physics
    Type of Medium: Electronic Resource
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  • 14
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 54 (1989), S. 1769-1771 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The depth dependence of silicon donor passivation and reaction in hydrogenated GaAs is directly determined for the first time by using 1000 A(ring) layers of 1017 cm−3 Si-doped GaAs, buried at various depths in undoped GaAs. Low-frequency hydrogen plasma exposure for 30 min at 250 °C reduces the carrier density by only a factor of 3 in layers buried 3 μm deep, but by three orders of magnitude in layers buried 0.3 μm deep. Annealing at 400 °C for 5 min restores 100% of the original carrier density in the 3-μm-deep layer but only 73% in the 0.3-μm-deep layer. Plasma exposure and 400 °C annealing together do not improve the mobility in the molecular beam epitaxial samples at any depth. Hydrogen-related acceptors seen by photoluminescence account for these effects.
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  • 15
    Electronic Resource
    Electronic Resource
    s.l. : American Chemical Society
    Analytical chemistry 61 (1989), S. 994-998 
    ISSN: 1520-6882
    Source: ACS Legacy Archives
    Topics: Chemistry and Pharmacology
    Type of Medium: Electronic Resource
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  • 16
    ISSN: 1476-4687
    Source: Nature Archives 1869 - 2009
    Topics: Biology , Chemistry and Pharmacology , Medicine , Natural Sciences in General , Physics
    Notes: [Auszug] In Fig. la we show a fluorescence image of single 21-A-radius CdSe nanocrystals, embedded in a thin polyvinylbutyral film, at room temperature. The streaks in the image are a consequence of raster scanning the sample across a diffraction-limited laser spot, and arise due to the discrete turning on ...
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  • 17
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 74 (1993), S. 6139-6145 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The effect of the ambient conditions in the growth chamber of the molecular beam epitaxy machine during the growth of GaAs/Al0.35Ga0.65As structures was investigated. Both growth-interrupted (120 s at each heterointerface) and uninterrupted surfaces and interfaces were evaluated using a growth temperature of 580 °C. Two ambient conditions were studied: (a) ∼1×10−10 Torr O2; and (b) ultrahigh vacuum (UHV, ∼5×10−11 Torr, with no intentional introduction of contaminants). A striking difference was observed in both the 1.7 K photoluminescence (PL) spectra of single quantum well (SQW) structures and UHV scanning tunneling microscopy (STM) of surfaces, which were grown under ambient condition (a) as opposed to (b). When consecutive growth-interrupted SQW samples were grown with different well widths (25 and 28 A(ring)) under condition (a), the emission energy splitting into several peaks was observed, indicating discrete thicknesses of the well. However, the peak energies shifted as the laser spot was scanned across each sample. Additionally, the peak energy shifted from sample to sample for the same nominal well width.On the other hand, when SQW samples were grown under condition (b), no variation in the emission energy was observed as the laser was scanned across the sample, or from sample to sample for a given well width. Furthermore, the PL observations are supported by UHV-STM results. UHV-STM images indicated a very rough surface with large islands containing small terraces on top (a bimodal distribution) for condition (a). Conversely, when samples were grown under condition (b), only large islands were observed. For growth interrupted GaAs surfaces, 400 A(ring)×600 A(ring) islands were observed, and for Al0.35Ga0.65As, they were 150 A(ring)×400 A(ring), with a one-monolayer step in between islands. These data are consistent with abrupt interfaces with only a single-mode distribution for growth-interrupted surfaces. On the other hand, UHV-STM images of uninterrupted GaAs surfaces grown under condition (b) showed islands that were 40–60 A(ring) across. Photoluminesce spectra of a similarly grown SQW sample showed only a single broad emission line, consistent with an interface configuration of many steps which are smaller than the exciton diameter. The results show that interface roughness is sensitive to background O2.
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  • 18
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 71 (1992), S. 2403-2407 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The luminescence properties of 3 μm thick, strongly emitting, and highly porous silicon films were studied using a combination of photoluminescence, transmission electron microscopy, and Fourier transform infrared spectroscopy. Transmission electron micrographs indicate that these samples have structures of predominantly 6–7 nm size clusters (instead of the postulated columns). In the as-prepared films, there is a significant concentration of Si—H bonds which is gradually replaced by Si—O bonds during prolonged aging in air. Upon optical excitation these films exhibit strong visible emission peaking at ≈690 nm. The excitation edge is shown to be emission wavelength dependent, revealing the inhomogeneous nature of both the initially photoexcited and luminescing species. The photoluminescence decay profiles observed are highly nonexponential and decrease with increasing emission energy. The 1/e times observed typically range from 1 to 50 μs. The correlation of the spectral and structural information suggests that the source of the large blue shift of the visible emission compared to the bulk Si band gap energy is likely to be due to quantum confinement in the nanometer size Si clusters. The electron-hole recombination process, on the other hand, remains unclear.
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  • 19
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 68 (1990), S. 4116-4118 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We measured the forward current-voltage characteristics of self-electro-optic effect devices (SEED). These devices consist of p-i-n diodes where the i region is a GaAs/AlxGa1−xAs (x∼0.3) multiple-quantum-well structure. It is found that the diode current varies as exp(qV/2 kT) and that it also scales with the junction perimeter for diodes of different mesa sizes, indicating nonradiative surface recombination at the mesa sidewalls. We also measured minority-carrier lifetimes from photoluminescence decay experiments. They revealed that the recombination rate increases with decreasing mesa size, once again indicating that surface recombination at the mesa sidewalls limits carrier lifetime. A value of 6×105 cm s−1 for the surface recombination velocity for the sidewalls is determined. The implication of the nonradiative surface recombination at the mesa sidewalls is that it undermines the performance of the SEED as the mesa size decreases by reducing the photocurrent, thereby leading to higher bistability voltage threshold and hence higher switching energy.
    Type of Medium: Electronic Resource
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  • 20
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 64 (1988), S. 6727-6732 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: GaAs hereroepitaxial films on Si contain a high number of misfit dislocations and large internal stresses due to the lattice and thermal mismatch of the two materials. These greatly affect the structural, optical, and electrical properties of the films. We report a study of these effects in films grown by metalorganic chemical vapor deposition using x-ray diffraction, sample curvature, photoluminescence, and carrier concentration measurements. The x-ray data indicate that the lattice misfit strain is almost entirely relieved by the generation of dislocations, but that the difference in thermal expansion between the film and substrate causes significant tetragonal distortion of the GaAs lattice which results in wafer bowing and, for thicker GaAs layers, film cracking. Wafer bowing was successfully eliminated by growth of GaAs films on both sides of the Si substrate. Photoluminescence spectra of crack-free GaAs layers indicated that the thermally induced strain was distributed in a nonuniform but continuous manner throughout the film. The magnitude of the strain, as determined from x-ray diffraction, wafer curvature, and photoluminescence spectroscopy, was consistently 10% lower than the value calculated from simple thermal relaxation. Finally, for large numbers of misfit defects (〉108 cm−2) the electrical properties of the sample were found to be correlated to the mean dislocation density of the GaAs film.
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