Publikationsdatum:
2015-09-23
Beschreibung:
We present an industry-relevant, large-scale, ultra-high vacuum (UHV) magnetron sputtering and cathodic arc deposition system purposefully designed for time-resolved in situ thin film deposition/annealing studies using high-energy (〉50 keV), high photon flux (〉10 12 ph/s) synchrotron radiation. The high photon flux, combined with a fast-acquisition-time (
Print ISSN:
0034-6748
Digitale ISSN:
1089-7623
Thema:
Elektrotechnik, Elektronik, Nachrichtentechnik
,
Physik
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