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  • 1
    Digitale Medien
    Digitale Medien
    Springer
    Il nuovo cimento della Società Italiana di Fisica 18 (1996), S. 1167-1177 
    ISSN: 0392-6737
    Schlagwort(e): Optoelectronic devices ; Conference proceedings
    Quelle: Springer Online Journal Archives 1860-2000
    Thema: Physik
    Notizen: Summary We report room temperature time-resolved photoluminescence (PL) and temperature dependence of continuous wave (cw) PL studies of high fluence (from 3·1016 to 3·1017 cm−2) Si+-implanted thermal SiO2 layers after annealing at high temperature (T=1000°C). Such measurements were related to TEM analysis of samples. Nancocrystals were observed at TEM only a samples implanted at higher fluence. In these samples a near infrared PL signal peaked at approximately 1.5 eV with decay time of about 100 μs is present. Besides, in all samples a light emission is present in the green region of the spectrum. The intensity of the emission shows large variations with ion fluence, and is characterized by 0.4, 2 and 7 ns decay times.
    Materialart: Digitale Medien
    Standort Signatur Erwartet Verfügbarkeit
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  • 2
    Digitale Medien
    Digitale Medien
    Amsterdam : Elsevier
    Physica B: Physics of Condensed Matter 170 (1991), S. 259-264 
    ISSN: 0921-4526
    Quelle: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Thema: Physik
    Materialart: Digitale Medien
    Standort Signatur Erwartet Verfügbarkeit
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  • 3
    Digitale Medien
    Digitale Medien
    Amsterdam : Elsevier
    Progress In Crystal Growth And Characterization 15 (1987), S. 97-134 
    ISSN: 0146-3535
    Quelle: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Thema: Geologie und Paläontologie , Physik
    Materialart: Digitale Medien
    Standort Signatur Erwartet Verfügbarkeit
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  • 4
    Digitale Medien
    Digitale Medien
    Amsterdam : Elsevier
    Progress in Quantum Electronics 17 (1993), S. 273-298 
    ISSN: 0079-6727
    Quelle: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Thema: Elektrotechnik, Elektronik, Nachrichtentechnik , Physik
    Materialart: Digitale Medien
    Standort Signatur Erwartet Verfügbarkeit
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  • 5
    Digitale Medien
    Digitale Medien
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 63 (1988), S. 4911-4920 
    ISSN: 1089-7550
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: A model to describe the amorphization in ion-implanted silicon is presented, based on the idea that a transferred energy threshold (around 5 keV) is necessary to produce a sufficiently branched and energetic cascade. This amorphizing cascade is seen first as energetic two body collisions, then as the branching of the primary skeleton and, at the final stages, as a hot cloud in which the primary energy is equipartitioned, and remains adiabatically confined before cloud quenching. This view allows some quantitative estimations: the dimension of the cloud, the threshold energy for their formation, and the number of the involved atoms. Original experimental evidence is presented to support this framework. In principle, the behavior of boron implanted in (100) silicon, at a constant fluence (9×1015 cm−2) and at a variable impinging energy (in the range 20–45 keV), puts in evidence the possibility to amorphize only above a critical threshold. The position of the amorphized regions also suggests that amorphization can take place only where sufficiently energetic recoils are produced. The existence of point defects out of the amorphized regions and their progressive involvement causes superlinear amorphization effects. This mechanism is viewed, in the framework of this model, as a decreasing of the amorphization threshold energy, because of the releasing of the residual energy by the involved point defects. The predictions of the model are compared with the experimental data referring to N+ implanted into (111) silicon at 40 keV, and the resulting agreement is quite satisfactory.
    Materialart: Digitale Medien
    Standort Signatur Erwartet Verfügbarkeit
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  • 6
    Digitale Medien
    Digitale Medien
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 60 (1986), S. 310-317 
    ISSN: 1089-7550
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: Four different Co-silicide compounds were obtained by solid-state reaction at 800 °C in thin bilayers of amorphous silicon and cobalt evaporated on SiO2 substrates. Rutherford backscattering spectroscopy (2 MeV 4He+), x-ray diffraction, and Auger electron spectroscopy were used to obtain information about the chemical and crystallographic characteristics of the samples. Results indicate that in each sample only one of the following phases is present: CoSi2, CoSi, Co2Si, and Co4Si, the latter identified on the basis of the stoichiometric ratio only. Electrical resistivity and Hall effect measurements on van der Pauw structures were carried out as a function of the temperature in the intervals: 10–1000 and 10–300 K, respectively. At room temperature the resistivity ranges from the value 19 μΩ cm for CoSi2 to the value 142 μΩ cm for CoSi. There are some analogies with the case of a classical metal, but remarkable differences are also detectable in the resistivity versus temperature behavior and in the order of magnitude of the resistivity and of the Hall coefficient. In particular, at T〉300 K the resistivity of the CoSi2 samples linearly depends on temperature and is well fitted by the classical Bloch–Grüneisen expression. The other silicides show, in the same temperature range, a deviation from linearity (d2ρ/dT2〈0), while a quasi saturation of the resistivity can be extrapolated at higher temperatures. This saturation phenomenon can be described by the parallel of an ideal conductivity and of a saturation conductivity, and associated with the electron mean free path approaching interatomic distances. A similar model already has been put forth to describe the saturation of the resistivity in systems, such as A-15 superconducting compounds, characterized by a high value of the room-temperature resistivity. The transport parameters, deduced in a free electron framework from the resistivity curves of the Co silicides, show values which are consistent with the proposed model. Hall coefficient versus temperature behavior indicates that between 10 and 300 K a multicarrier effect is present. Conduction is predominantly n type in CoSi and p type in the other silicides.
    Materialart: Digitale Medien
    Standort Signatur Erwartet Verfügbarkeit
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  • 7
    Digitale Medien
    Digitale Medien
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 58 (1985), S. 264-267 
    ISSN: 1089-7550
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: Current effects in heavy arsenic implants into silicon protected by a SiO2 layer were studied by Rutherford backscattering, spectrometry, differential sheet resistivity and Hall mobility measurements, Auger electron spectrometry, and transmission electron microscopy. It was found that oxygen atoms recoiled into silicon by the impinging arsenic ions affect the solid-phase epitaxial regrowth during the low-temperature ((approximately-equal-to)500 °C) postimplant anneal. A complete stopping in the regrowth was noticed in samples implanted at 1016 cm−2 at low current and annealed at 500 °C. These results show that the procedure suggested to obtain high-quality implanted layers, i.e., (1) formation of an amorphous layer with implants at low temperature and (2) solid-phase epitaxy at about 500 °C, is not suitable for implants through a SiO2 layer.
    Materialart: Digitale Medien
    Standort Signatur Erwartet Verfügbarkeit
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  • 8
    Digitale Medien
    Digitale Medien
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 66 (1995), S. 851-853 
    ISSN: 1077-3118
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: We report the observation of visible-light emission at room temperature from high fluence (0.3–3×1017 cm−2) Si+ implanted thermal SiO2 layers grown on silicon substrates. Significant blue-light emission and an intense broad luminescent band with a peak beyond 750 nm are observed after annealing at high temperature (T≥1000 °C). The red-light emission, present only in the highest fluence implant, is attributed to the luminescence emitted from silicon nanocrystals produced by silicon precipitation. The presence of silicon nanocrystals is confirmed by transmission electron microscopy. Significant blue-light emission is visible after thermal annealing in the 1×1017 cm−2 fluence implant. The peak position shifts from 490 to 540 nm by increasing the annealing cycles temperature. © 1995 American Institute of Physics.
    Materialart: Digitale Medien
    Standort Signatur Erwartet Verfügbarkeit
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  • 9
    Digitale Medien
    Digitale Medien
    Amsterdam : Elsevier
    Nuclear Inst. and Methods in Physics Research, B 19-20 (1987), S. 454-456 
    ISSN: 0168-583X
    Quelle: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Thema: Physik
    Materialart: Digitale Medien
    Standort Signatur Erwartet Verfügbarkeit
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  • 10
    Digitale Medien
    Digitale Medien
    Amsterdam : Elsevier
    Nuclear Inst. and Methods in Physics Research, B 19-20 (1987), S. 488-491 
    ISSN: 0168-583X
    Quelle: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Thema: Physik
    Materialart: Digitale Medien
    Standort Signatur Erwartet Verfügbarkeit
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