ISSN:
1573-4846
Keywords:
β-chloroethylsilsesquioxane
;
β-chloroethyltrichlorosilane
;
spin-on glass
;
thermal conversion
;
dielectric films
;
silicon dioxide
Source:
Springer Online Journal Archives 1860-2000
Topics:
Chemistry and Pharmacology
Notes:
Abstract The hydrolytic generation of SiO2 films from chlorosilanes or alkoxysilanes is interrupted by incorporating labile organic groups which stop SiO2 formation at a processable prepolymer stage. The monomers for the prepolymer have electron withdrawing substituents in the β -position. The organic groups are removed from the prepolymer at low temperature, extruding ethylene. The formation of SiO2 proceeds by intramolecular condensation of the electronegative substituents which are now in a hydrolytically unstable bond with silicon and hydroxyl groups or ambient moisture. Films of the prepolymer spun onto silicon wafers are converted into uniform SiO2-rich films at temperatures between 150–400°C.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1023/A:1018333823471
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