ISSN:
1572-8986
Keywords:
X-ray mask
;
X-ray absorber
;
vacuum lithography
;
plasma polymerization
;
plasma etching
Source:
Springer Online Journal Archives 1860-2000
Topics:
Chemistry and Pharmacology
,
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
,
Technology
Notes:
Abstract Gold particles containing plasma-polymerized styrene film were formed simultaneously by plasma polymerization and evaporation using an inductively coupled argon gas flow type reactor. Gold was used as the evaporated metal and styrene as the monomer. The plasma etching characteristics of the film were evaluated by O2 and CO2 plasmas using a reactor with parallel-plate electrodes. A structure of lines and spaces of 4μm width was successfully fabricated in the film on Si wafer by CO2 plasma etching through a mask pattern of plasma-polymerized resist. A self-developed pattern was obtained through the X-ray mask with polyimide substrate by synchrotron radiation. The molecular structure and atomic composition of the film were investigated by ESCA and TEM.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1007/BF01019175
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