ISSN:
0142-2421
Schlagwort(e):
polycarbonate
;
SF6
;
plasma
;
XPS, SFM
;
AFM
;
mass spectroscopy
;
Chemistry
;
Polymer and Materials Science
Quelle:
Wiley InterScience Backfile Collection 1832-2000
Thema:
Physik
Notizen:
A systematic investigation was made of the chemical and morphological influences of SF6 plasma on polycarbonate and the influence of plasma treatment on Al metallization. Mass and ion spectroscopy were used for characterization of the plasma and the etching process. X-ray photoelectron spectroscopy (XPS) measurements were applied for the chemical characterization, while atomic force microscopy (AFM) (static and dynamic mode) served to inspect the surface morphology. All analytical techniques were performed in an ultrahigh vacuum system, in order to prevent the polycarbonate sample from being exposed to ambient air after the plasma treatment. During the etching process we used mass difference spectra to demonstrate the removal of masses 19, 28 and 32 corresponding to HF, CO (N2) and CF. Additionally, the inclusion of fluorine was also observed by this technique.The XPS spectra of polycarbonate surfaces show a significant inclusion of fluorine (C-F, C-F2) and a reduction of the oxygen content after the plasma treatment. Aluminium metallization leads to the formation of an Al-F interlayer; metallic growth of Al is only observed when the metallic layers become thicker than a few nanometres.The AFM investigations have shown that even a short plasma treatment causes changes in morphology (structures with an extension of 20-40 nm). After extended plasma exposure the surface becomes very rough, resulting in poor Al adhesion. On untreated polycarbonate, Al grows in the form of weakly bound clusters, which can only be imaged in the dynamic AFM mode. After plasma treatment, Al grows in the form of well-adhering flat layers without clustering. © 1998 John Wiley & Sons, Ltd.
Zusätzliches Material:
14 Ill.
Materialart:
Digitale Medien
Permalink
