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  • Polymer and Materials Science  (29)
  • Auxin and stem growth  (2)
  • common wheat  (2)
  • 1
    Electronic Resource
    Electronic Resource
    Indole-3-acetic acid levels after phytochrome-mediated changes in the stem elongation rate of dark- and light-grown Pisum seedlings (1992)
    Springer
    Planta 188 (1992), S. 85-92 
    Details
    ISSN: 1432-2048
    Keywords: Auxin and stem growth ; Epidermis and stem growth ; Pisum (stem growth) ; Phytochrome stem growth ; Stem elongation
    Source: Springer Online Journal Archives 1860-2000
    Topics: Biology
    Notes: Abstract The effect of red (R) and far-red (FR) light on stem elongation and indole-3-acetic acid (IAA) levels was examined in dwarf and tall Pisum sativum L. seedlings. Red light reduced the extension-growth rate of etiolated seedlings by 70–90% after 3 h, and this inhibition was reversible by FR. Inhibition occurred throughout the growing zone. After 3 h of R, the level of extractable IAA in whole stem sections from the growing zone of etiolated plants either increased or showed no change. By contrast, extractable IAA from epidermal peels consistently decreased 3 h after R treatments. Decreases of 40% were observed for epidermal peels from the top 1 cm of tall plants receiving 3 h R. Brief R treatments resulted in smaller decreases in epidermal IAA levels and these decreases were not as great when FR followed R. In lightgrown plants, end-of-day FR stimulated growth during the following dark period in a photoreversible manner. The uppermost 1 cm of expanding third internodes was most responsive to the FR. Extractable IAA from epidermal peels from the upper 1 cm of third internodes increased by 30% or more 5 h after FR. When R followed the FR the increases were smaller. Levels of IAA in whole stem sections did not change and were twofold greater than in dark-grown plants. In both dark- and light-grown tall plants, IAA levels were lower in epidermal peels than in whole stem segments. These results provide evidence that IAA is compartmentalized at the tissue level within the growing stem and that phytochrome regulation of stem elongation rates may be partly based on modulating the level of IAA within the epidermis.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF00198943
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  • 2
    Electronic Resource
    Electronic Resource
    Indole-3-acetic acid levels after phytochrome-mediated changes in the stem elongation rate of dark- and light-grownPisum seedlings (1992)
    Springer
    Planta 188 (1992), S. 85-92 
    Details
    ISSN: 1432-2048
    Keywords: Auxin and stem growth ; Epidermis and stem growth ; Pisum (stem growth) ; Phytochrome stem growth ; Stem elongation
    Source: Springer Online Journal Archives 1860-2000
    Topics: Biology
    Notes: Abstract The effect of red (R) and far-red (FR) light on stem elongation and indole-3-acetic acid (IAA) levels was examined in dwarf and tallPisum sativum L. seedlings. Red light reduced the extension-growth rate of etiolated seedlings by 70–90% after 3 h, and this inhibition was reversible by FR. Inhibition occurred throughout the growing zone. After 3 h of R, the level of extractable IAA in whole stem sections from the growing zone of etiolated plants either increased or showed no change. By contrast, extractable IAA from epidermal peels consistently decreased 3 h after R treatments. Decreases of 40% were observed for epidermal peels from the top 1 cm of tall plants receiving 3 h R. Brief R treatments resulted in smaller decreases in epidermal IAA levels and these decreases were not as great when FR followed R. In lightgrown plants, end-of-day FR stimulated growth during the following dark period in a photoreversible manner. The uppermost 1 cm of expanding third internodes was most responsive to the FR. Extractable IAA from epidermal peels from the upper 1 cm of third internodes increased by 30% or more 5 h after FR. When R followed the FR the increases were smaller. Levels of IAA in whole stem sections did not change and were twofold greater than in dark-grown plants. In both dark- and light-grown tall plants, IAA levels were lower in epidermal peels than in whole stem segments. These results provide evidence that IAA is compartmentalized at the tissue level within the growing stem and that phytochrome regulation of stem elongation rates may be partly based on modulating the level of IAA within the epidermis.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF01160716
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  • 3
    Electronic Resource
    Electronic Resource
    Chromosome location of genes for resistance to powdery mildew in common wheat (Triticum aestivum L.) 1. Mlk and other alleles at the Pm3 locus (1993)
    Springer
    Euphytica 68 (1993), S. 223-229 
    Details
    ISSN: 1573-5060
    Keywords: common wheat ; Triticum aestivum ; resistance genes ; Erysiphe graminis tritici ; powdery mildew ; monosomic analysis ; allelism tests
    Source: Springer Online Journal Archives 1860-2000
    Topics: Agriculture, Forestry, Horticulture, Fishery, Domestic Science, Nutrition
    Notes: Summary Several wheat cultivars/lines were inoculated with isolates of Erysiphe graminis tritici to identify new genes/alleles for resistance. The wheats were tested with 13 isolates that had been characterized from responses on differential lines with known resistance genes. Gene Mlk which occurs in cultivars ‘Kolibri’, ‘Syros’, ‘Ralle’ and several other European common wheats was found to be an allele at the Pm3 locus and is now designated Pm3d. The mildew resistance in an old Australian wheat, ‘W150’, is conferred by a single gene also allelic to Pm3 and now designated Pm3e. The near-isogenic line ‘Michigan Amber/8*Cc’ possesses another allele now designated Pm3f. A Syrian land variety of common wheat shows mildew resistance that is conditioned by the combination of genes Pm1 and Pm3a. Finally, two accessions of Triticum aestivum ssp. sphaerococcum appeared to possess the Pm3c allele.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF00029876
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  • 4
    Electronic Resource
    Electronic Resource
    Chromosomal location of powdery mildew resistance genes in common wheat (Triticum aestivum L. em. Thell.) 3. Gene Pm22 in cultivar Virest (1996)
    Springer
    Euphytica 91 (1996), S. 149-152 
    Details
    ISSN: 1573-5060
    Keywords: common wheat ; Triticum aestivum ; powdery mildew ; resistance gene ; monosomic analysis ; gene location
    Source: Springer Online Journal Archives 1860-2000
    Topics: Agriculture, Forestry, Horticulture, Fishery, Domestic Science, Nutrition
    Notes: Summary Common wheat cultivar Virest possesses mildew resistance which is different from resistances expressed by currently documented mildew resistance genes, detected by response to eleven differential wheat powdery mildew isolates. F2 populations from hybrids of the 21 ‘Chinese Spring’ monosomic lines with ‘Virest’ revealed one major dominant gene, located on wheat chromosome 1D. The new gene is designated Pm22. Italian cultivars Elia, Est Mottin, Ovest and Tudest also showed the disease response pattern corresponding to ‘Virest’.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF00021064
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  • 5
    Electronic Resource
    Electronic Resource
    Oriented polymer materials, Hrsg. von Stoyko Fakirov, 512 Seiten, 337 Abb, 42 Tab., Hüthig & Wepf Verlag, Zug-Heidelberg-Oxford 1996, DM 188,00, ISBN 3-85739-123-5 (1997)
    Weinheim [u.a.] : Wiley-Blackwell
    Materials and Corrosion/Werkstoffe und Korrosion 48 (1997), S. 73-74 
    Details
    ISSN: 0947-5117
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/maco.19970480117
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  • 6
    Electronic Resource
    Electronic Resource
    Material science of polymers for engineers. Von T. A. Osswald, G. Menges, 492 Seiten, 439 Bilder, Carl Hanser Verlag, München, Wien, New York 1995, DM 78.00, ISBN 3-466-17261-0 (1997)
    Weinheim [u.a.] : Wiley-Blackwell
    Materials and Corrosion/Werkstoffe und Korrosion 48 (1997), S. 198-199 
    Details
    ISSN: 0947-5117
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/maco.19970480316
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  • 7
    Electronic Resource
    Electronic Resource
    Polystyrol. Kunststoff Handbuch Band 4. Hrsg. von G. Becker, D. Brown, Band-Hrsg.: H. Gausepohl, R. Gellert, 767 Seiten, 628 Abb., 126 Tab., Carl Hanser Verlag, München, Wien 1995, DM 448,00, ISBN 3-446-18004-4 (1997)
    Weinheim [u.a.] : Wiley-Blackwell
    Materials and Corrosion/Werkstoffe und Korrosion 48 (1997), S. 134-134 
    Details
    ISSN: 0947-5117
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/maco.19970480210
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  • 8
    Electronic Resource
    Electronic Resource
    Spectral holes as probes for structural transitions in polymersVortrag anläßlich der Tagung der Fachgruppe “Makromolekulare Chemie” der Gesellschaft Deutscher Chemiker über “Polymere und Licht”. in Bad Nauheim vom 7. bis 9. Mai 1990. (1990)
    Weinheim : Wiley-Blackwell
    Angewandte Makromolekulare Chemie 183 (1990), S. 115-122 
    Details
    ISSN: 0003-3146
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Physics
    Notes: We show how narrow spectral holes burnt into the inhomogeneous absorption of dye doped polymers can be used as extremely sensitive detectors for measuring structural rearrangement processes. A model is suggested which relates the observed hole burning phenomena to the specific heat of the conformation phase space.
    Additional Material: 5 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/apmc.1990.051830106
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  • 9
    Electronic Resource
    Electronic Resource
    Untersuchungen zur Plasmaätzung von Polymeren. IV. Selektives Plasmaätzen von Polyethylenen unterschiedlicher KristallinitätTeil III: Acta Polymerica 31 (1980) 59-62 (1980)
    Weinheim : Wiley-Blackwell
    Acta Polymerica 31 (1980), S. 310-315 
    Details
    ISSN: 0323-7648
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Physics
    Description / Table of Contents: Polyethylenes of different crystallinity and crosslinking were etched plasmachemically for revealing supermolecular structures. Electron microscopic patterns of the etched polymer surfaces show differences in the degree of crystallinity up to 3%.
    Notes: Polyethylenproben unterschiedlicher Kristallinität und Vernetzung wurden zur Freilegung übermolekularer Strukturen plasmachemisch geätzt. Die elektronemikroskopischen Aufnahmen der geätzten Polymeroberflächen zeigten, daß sich Unterschiede im Kristallinitätsgrad bis zu 3% im Ätzrelief widerspiegeln.
    Additional Material: 7 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/actp.1980.010310506
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  • 10
    Electronic Resource
    Electronic Resource
    Untersuchungen zur Plasmaätzung von Polymeren. Teil I: Strukturänderungen von Polymeren nach Plasmaätzung (1979)
    Weinheim : Wiley-Blackwell
    Acta Polymerica 30 (1979), S. 470-477 
    Details
    ISSN: 0323-7648
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Physics
    Description / Table of Contents: In the plasma of electrical discharges polymer samples are subjected to oxidation causing reactive sites or to degradation. Further, a significant volume (depth) effect in a 5 to 10 μm surface layer was observed which was caused by plasma UV radiation. These photolytical effects result in changes of the polymer structure, as crosslinking, change of crystallinity, radical formation etc. Therefore, the etching patterns reflect the features of secondary structures formed by these processes.
    Notes: Polymere werden im Plasma einer elektrischen Entladung an der Oberfläche funktionalisiert (oxydiert) bzw. abgebaut. Daneben wurde jeweils ein signifikanter, auf eine 5 bis 10 μm starke Schicht an der Oberfläche beschränkter Volumeneffekt („Tiefeneffekt“) beobachtet, der durch die Plasma-UV-Strahlung verursacht wird. Diese photolytischen Erscheinungen führen zu Änderungen im Polymergefüge wie Vernetzung, Veränderung der Kristallinität, Radikalbildung usw. Abbildungen von Polymerätzstrukturen spiegeln deshalb in gewissem Umfang die solchermaßen veränderte Sekundärstruktur wider.
    Additional Material: 10 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/actp.1979.010300802
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