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  • Polymer and Materials Science  (3)
Collection
Publisher
Years
  • 1
    Electronic Resource
    Electronic Resource
    New York, NY [u.a.] : Wiley-Blackwell
    Advanced Materials for Optics and Electronics 5 (1995), S. 157-161 
    ISSN: 1057-9257
    Keywords: CdTe ; iodine doping ; diffusion ; Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Electrical Engineering, Measurement and Control Technology , Physics
    Notes: Studies on the diffusion of iodine into CdTe at a temperature of 20°C using four widely differing types of diffusion sources are compared and discussed. The concentration profiles were measured using either a radiotracer sectioning (RTS) technique or secondary ion mass spectrometry (SIMS).The profiles were composed of four parts to which a computer package consisting of the sum of four complementary error functions (erfc) gave accurate fits, providing four empirical values of the diffusivity. The diffusivities for the fastest component in all four cases were in agreement (∼2 × 10-14 cm2 s-1) and were consistent with previously published data. These results indicate that when iodine is diffused from the vapour it is not a suitable long-termstable dopant in devices where sharp junctions are required.
    Additional Material: 4 Ill.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    New York, NY [u.a.] : Wiley-Blackwell
    Advanced Materials for Optics and Electronics 3 (1994), S. 209-215 
    ISSN: 1057-9257
    Keywords: Diffusion ; Cadmium telluride ; Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Electrical Engineering, Measurement and Control Technology , Physics
    Notes: The rates of diffusion of both Ga and Cu in CdTe have been measured over the temperature ranges 350-820 and 200-400°C respectively and the results are compared with the self-diffusion of Cd (350-920°C).In the case of the Cd self-diffusion the Arrhenius graph showed two active diffusion mechanisms, one dominating above 500°C and the other below. It suggested that in the temperature range 500-800°C the main defect responsible for diffusion was Cdi-, with a significant contribution at lower temperatures from the associated defect of the form (CdiVcd)x Below 500°C another mechanism predominated which was possibly due to residual impurities.The results for the diffusions were in close agreement with those obtained by other workers. The Ga diffusions showed a complex behaviour which suggested that two mechanisms were active simultaneously, one independent of Cd partial pressure and the other decreasing with increasing Cd partial pressure.It was concluded that CdTe would be suitable as a diffusion barrier to protect HgxCd1 - xTe devices from Ga contamination from GaAs substrates but would not be efficient at reducing Cu contamination from the substrate in the device.
    Additional Material: 5 Ill.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    New York, NY [u.a.] : Wiley-Blackwell
    Advanced Materials for Optics and Electronics 7 (1997), S. 1-8 
    ISSN: 1057-9257
    Keywords: CdTe ; iodine doping ; electrical activity ; Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Electrical Engineering, Measurement and Control Technology , Physics
    Notes: The electrical activity of iodine in CdTe is discussed when iodine is introduced into the CdTe by diffusion from the vapour phase. It is compared both with the total concentration of iodine in the diffused CdTe slices and with the electrical activity in CdTe slices which have been annealed under Cd- and Te-saturated vapour pressures.Iodine-diffused slices of CdTe were profiled by secondary ion mass spectrometry (SIMS) to obtain the total iodine concentration and by capacitance-voltage (C-V) techniques to obtain the net concentration of electrically active iodine. After annealing with iodine in the form of Cdl2, the slices were p-type, similar to those obtained when CdTe was annealed in either excess Te or Cd vapour, and they showed no significant increase in electrical activity. If Cd was added to the Cdl2 diffusion source or the CdTe was given a subsequent anneal in cadmium vapour, the slices became n-type. The results indicated that in all cases a neutral layer composed of Cd nIm (m and n are integers) formed on the surface layers, whereas if Cd was involved in the diffusion, some of the iodine existed in an electrically active form deeper into the slice with a maximum concentration of active carriers given by ND - NA ≈ 1017 cm-3. © 1997 John Wiley & Sons Ltd.
    Additional Material: 6 Ill.
    Type of Medium: Electronic Resource
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