ISSN:
0142-2421
Keywords:
Chemistry
;
Polymer and Materials Science
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Physics
Notes:
Titanium nitride films were deposited using various process parameters. The film stoichiomtery and the optical properties were than measured for all of the films. As expected, the stoichiometry is affected by the deposition rate and composition of the gas phase. We show that the index of refraction is affected by the substrate temperature as well as by the stoichiometry. We also show that as long as the amount of nitrogen in the film is above a critical value, the film is nitride-like. When the amount of nitrogen in the film drops below a critical value, the index of refraction is more characteristic of metallic titanium than titanium nitride.
Additional Material:
3 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/sia.740170107
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