ISSN:
0142-2421
Schlagwort(e):
Cu-Al
;
Ag-Al
;
interdiffusion
;
ion beam bombardment
;
in situ RBS
;
phase formation
;
PACS nos 61.66.Dk, 61.80.Jh, 61.82.Bg and 68.35.Fx
;
Chemistry
;
Polymer and Materials Science
Quelle:
Wiley InterScience Backfile Collection 1832-2000
Thema:
Physik
Notizen:
Ion beam-induced interdiffusion and phase formation processes in thin Cu-Al and Ag-Al multilayers were investigated with in situ RBS and X-ray diffraction (XRD), respectively. The metal layers were deposited by evaporation on polished glassy carbon and single-crystal silicon substrates. In order to initiate interdiffusion, the specimens were bombarded with high-current 2.0 MeV 4He+ ion beams. Depending on the metal layer system, different interdiffusion and phase formation behaviour were observed (phases formed after irradiation: Al2Cu, Al4Cu9 and Ag2Al). Fast interdiffusion was measured for the Ag-Al and Cu-Al systems deposited on glassy carbon, whereas much lower interdiffusion was observed for the same multilayered systems deposited on 〈100〉 Si, even though the multilayers of each system were deposited at the same time. In addition, the interdiffusion was significantly slower in Cu-Al multilayers than in Ag-Al multilayers. © 1998 John Wiley & Sons, Ltd.
Zusätzliches Material:
12 Ill.
Materialart:
Digitale Medien
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