Publication Date:
2019-07-13
Description:
A new concept for materials processing in space exploits the ultravacuum component of space for thin-film epitaxial growth. The unique LEO space environment is expected to yield 10-ftorr or better pressures, semiinfinite pumping speeds, and large ultravacuum volume (about 100 cu m) without walls. These space ultravacuum properties promise major improvement in the quality, unique nature, and throughput of epitaxially grown materials, including semiconductors, magnetic materials, and thin-film high-temperature superconductors.
Keywords:
MATERIALS PROCESSING
Type:
International Conference and Exhibition on the Commercial and Industrial Uses of Outer Space; Feb 21, 1988 - Feb 25, 1988; Montreux; Switzerland
Format:
text
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