Publication Date:
2019-06-28
Description:
Waste reduced, and silicon production rate improved. In new process silicon formed by thermal decomposition of SiH4. Part of silicon formed on silicon seed particles as result of surface chemical reaction. However, silicon formed by homogeneous reaction in gas phase tends to form aggregates of silicon atoms, which appear as fine particles (like dust). Believed that scavenging action of seed particles enables large fraction fines to be incorporated onto seed surface. This mode of growth confirmed by electron microscopy photographs.
Keywords:
MATERIALS
Type:
NPO-16034
,
NASA Tech Briefs (ISSN 0145-319X); 9; 2; P. 98
Format:
text
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