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  • Langmuir probe  (2)
  • 1
    Electronic Resource
    Electronic Resource
    Langmuir probe measurements during plasma-activated chemical vapor deposition in the system argon/oxygen/Aluminum isopropoxide (1993)
    Springer
    Plasma chemistry and plasma processing 13 (1993), S. 555-566 
    Details
    ISSN: 1572-8986
    Keywords: Langmuir probe ; plasma CVD ; rf discharge
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract A Langmuir probe investigation of Ar/O2/Al(OPr1)3 plasmas is described. The probe contamination depends on the probe position and the flow of tine carrier gases. Whereus far from the working gas inlet characteristics without any hysteresis were obtained, near to the inlet undisturbed characteristics were recorded only for small gas flows or a low vapor pressure of the precursor. Condensation of the precursor ai the probe surface prior to the plasma excitation was the main source of probe contamination. A decrease ire the plasma potential with respect to the ground observed during experiments was attributed to the formation of a dielectric film on the rf electrode. This resulted in a self-bias responsible for the decrease in plasma potential.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF01465882
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    Paper (German National Licenses)
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  • 2
    Electronic Resource
    Electronic Resource
    Langmuir probe measurements during plasma-activated chemical vapor deposition in the system argon/hydrogen/dicyclopentadienyldimethylhafnium (1995)
    Springer
    Plasma chemistry and plasma processing 15 (1995), S. 371-381 
    Details
    ISSN: 1572-8986
    Keywords: Langmuir probe ; plasma potential ; electron density ; electron energy ; plasma CVD ; rf-discharge
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract A Langomir probe investigation of Ar/H2/Cp2HfMe2 plasmas is described. The probe measurements were performed for various discharge conditions. The mean electron energy and electron density were measured for various power, gas flows of argon, and hydrogen and precursor concentrations. Addition of the precursor into the discharge resulted in an appreciable decrease in the electron density and an increase in the mean electron energr. Whereas a transition front the a-mode to the γ-mode has been observed with power rise in the Ar/H2 plasmas without precursor, in the presence of the precursor the plasota α-mode remained unchanged in the power range investigated.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF01650735
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    Paper (German National Licenses)
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