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  • Ions  (1)
  • Laser systems and laser beam applications  (1)
  • 1
    Electronic Resource
    Electronic Resource
    Springer
    Il nuovo cimento della Società Italiana di Fisica 15 (1993), S. 399-414 
    ISSN: 0392-6737
    Keywords: Ions ; Ultraviolet and visible radiation (including laser beams) ; Solid phase epitaxy ; Liquid phase epitaxy
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Notes: Summary The phase transition of amorphous to single-crystal silicon has been investigated not only by conventional heating in a furnace but under direct-energy processes like pulsed-laser and ion beam irradiation. The first method allows the experimental determination of the free-energy-temperature diagram for amorphous, liquid and crystalline silicon. Due to the very fast heating and cooling the amorphous-to-liquid transition can be investigated in both directions. Ion beam irradiation induces either a layer-by-layer amorphization or crystallization by the movement of the initial α-Si/c-Si interface according to the substrate temperature. The two processes are governed by different types of defects created by the beam in the amorphous and in the crystalline side of the interface. The existence of a native-oxide layer at the interface between single crystal and deposited layer retards the ion beam crystallization until oxygen atoms are dispersed by beam mixing in the matrix. A recent alternative way of crystallizing deposited layers is by short high-temperature anneals obtained by incoherent-light irradiations. In this case the rupture of the native-oxide layer is achieved by the agglomeration of oxide into beads, thus allowing the realignment. This technique appears to be particularly promising for several technological applications.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Springer
    Il nuovo cimento della Società Italiana di Fisica 4 (1984), S. 435-443 
    ISSN: 0392-6737
    Keywords: Laser systems and laser beam applications
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Description / Table of Contents: Riassunto La transizione amorfo-cristallo in GaAs impiantato è stata ottenuta mediante impulsi laser di potenza a λ=1.06 μm. La fusione dello strato superficiale è possibile in quanto lo strato amorfo è caratterizzato da un valore del coefficiente di assorbimento grande rispetto al materiale cristallino. I valori di soglia misurati sono di 0.8 J/cm2 per cristalli impiantati sia con 50 keV di Te che con 100 keV di Ar. Misure effettuate mediante incanalamento di ioni He+ da 2.0 MeV e spettroscopia dei fotoelettroni emessi a seguito d'irraggiamento con raggi X indicano che non vi è decomposizione apprezzabile a densità di energia prossime alla soglia. Per densità di energia molto piú alte del valore di soglia si osserva invece decomposizione superficiale e perdita di arsenico.
    Abstract: Резюме Исследуется переход аморфного состояния в монокристаллическое, индуцированный мощным импульсом неодимового лазера, в GaAs, имплантированном ионами, используя высокий козффициент поглощения в аморфных материалах. Плотность пороговой энергии составляет 0.8 Дж/см2 для внедренных ионов Te+ с энергией 50 кэВ и ионов Ar+ с энергией 100 кэВ. Эффект каналирования и техника рентгеновской фотоэлектронной спектроскопии указывают, что в узком окне плотности энергии немного выше порога не возникает заметного уменьщения As. Высокие плотности энергии вызывают потери Аз вблизи поверхностой области.
    Notes: Summary The amorphous-to-single crystal transition induced by high-power Nd laser pulse has been studied in ion-implanted GaAs by taking advantage of the high-absorption coefficient of amorphous material. A threshold energy density of about 0.8 J/cm2 has been measured for both 50 keV Te+ and 100 Ar+ implants. Channelling effect and X-ray photoelectron spectroscopy techniques indicate that no appreciable As loss occurs in a narrow energy density window just above threshold. High-energy densities cause instead As loss from the near surface region.
    Type of Medium: Electronic Resource
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