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  • 1
    Publication Date: 2019-08-28
    Description: A method utilizing a device to spray noble gases to cool the site of silicon crystal growth is described. The salient points are: (1) soft and uniform cooling was possible, (2) the length of the boundary surface of growth along the growth direction was made long over a wide width compared to the thickness, and (3) this made it possible to effectively remove the heat produced from solification. By using forced gas spraying on the solution surface in contact with the points of crystal growth, growth at the points of growth is enhanced and the rate of growth is speeded up.
    Keywords: ENERGY PRODUCTION AND CONVERSION
    Type: NASA-TM-75503 , Natl. Conv. of Elec. Studies; Jan 01, 1979
    Format: application/pdf
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