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  • 1
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    Thermally grown oxide and diffusions for automatic processing of integrated circuits (1979)
    In:  CASI
    Details
    Publication Date: 2019-06-28
    Description: A totally automated facility for semiconductor oxidation and diffusion was developed using a state-of-the-art diffusion furnace and high temperature grown oxides. Major innovations include: (1) a process controller specifically for semiconductor processing; (2) an automatic loading system to accept wafers from an air track, insert them into a quartz carrier and then place the carrier on a paddle for insertion into the furnace; (3) automatic unloading of the wafers back onto the air track, and (4) boron diffusion using diborane with plus or minus 5 percent uniformity. Processes demonstrated include Wet and dry oxidation for general use and for gate oxide, boron diffusion, phosphorous diffusion, and sintering.
    Keywords: ELECTRONICS AND ELECTRICAL ENGINEERING
    Type: NASA-TM-78247
    Format: application/pdf
    Location Call Number Expected Availability
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    NASA TECHNICAL REPORTS
  • 2
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    Chemical etching for automatic processing of integrated circuits (1981)
    In:  CASI
    Details
    Publication Date: 2019-06-28
    Description: Chemical etching for automatic processing of integrated circuits is discussed. The wafer carrier and loading from a receiving air track into automatic furnaces and unloading onto a sending air track are included.
    Keywords: ELECTRONICS AND ELECTRICAL ENGINEERING
    Type: NASA-TM-82411 , NAS 1.15:82411
    Format: application/pdf
    Location Call Number Expected Availability
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    NASA TECHNICAL REPORTS
  • 3
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    Chemical vapor deposition for automatic processing of integrated circuits (1980)
    In:  CASI
    Details
    Publication Date: 2019-06-28
    Description: Chemical vapor deposition for automatic processing of integrated circuits including the wafer carrier and loading from a receiving air track into automatic furnaces and unloading on to a sending air track is discussed. Passivation using electron beam deposited quartz is also considered.
    Keywords: ELECTRONICS AND ELECTRICAL ENGINEERING
    Type: NASA-TM-78274 , NAS 1.15:78274
    Format: application/pdf
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
    NASA TECHNICAL REPORTS
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