ISSN:
0032-3888
Keywords:
Chemistry
;
Chemical Engineering
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Chemistry and Pharmacology
,
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
,
Physics
Notes:
A novel photoresist material is described, consisting of a copolymer of 5-hexene-2-one and SO2, which performs with or without the addition of sensitizers. This photoresist forms non-tacky films that adhere well to silicon oxide without requiring thermal treatment. They also have useful sensitivity, can be developed to form highly-resolved images, are inert to conventional etchants, and are readily removed after etching. The synthesis, characterization, and a possible mechanism for photodegradation are presented.
Additional Material:
1 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/pen.760170603
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