Publication Date:
2012-04-04
Description:
Author(s): A. Antognini, P. Crivelli, T. Prokscha, K. S. Khaw, B. Barbiellini, L. Liszkay, K. Kirch, K. Kwuida, E. Morenzoni, F. M. Piegsa, Z. Salman, and A. Suter We report on muonium (Mu) emission into vacuum following μ + implantation in mesoporous thin SiO 2 films. We obtain a yield of Mu into vacuum of (38±4)% at 250 K and (20±4)% at 100 K for 5 keV μ + implantation energy. From the implantation energy dependence of the Mu vacuum yield we determine the Mu di... [Phys. Rev. Lett. 108, 143401] Published Tue Apr 03, 2012
Keywords:
Atomic, Molecular, and Optical Physics
Print ISSN:
0031-9007
Electronic ISSN:
1079-7114
Topics:
Physics
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