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  • 72.20.Ht  (1)
  • hierarchical design pyramid  (1)
  • Springer  (2)
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  • Springer  (2)
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  • 1
    Electronic Resource
    Electronic Resource
    Semi-insulating GaAs: A possible substrate for a field-assisted positron moderator (1994)
    Springer
    Applied physics 59 (1994), S. 259-273 
    Details
    ISSN: 1432-0630
    Keywords: 78.70.Bj ; 79.90 ; 72.20.Ht
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract Positron lifetime spectroscopy measurements have been carried out for semi-insulating GaAs with applied electric fields in the samples directed towards, and away from the positron injecting contact. The lifetime spectra have been decomposed into two components, the longer of which (≈400 ps) is characteristic of open volume defects at the metal-semiconductor interface through which positrons are injected. The interesting feature of these experiments is the large increase in the intensity of this interface component as the field is directed towards the contact. We show that this increase is caused by a significant fraction of implanted positrons drifting under the influence of a strong electric field produced by a layer of space-charge formed adjacent to the positron injecting contact. The general trend of the intensity variation is well explained by the proposed model. Experiments involving the application of an ac bias to the samples strengthen the suggestion that the space charge region is largely formed from ionized EL2 donors. The results of the present work indicate that semi-insulating GaAs possesses properties that make it a suitable material for the fabrication of a high efficiency (≈10%) room-temperature field-assisted positron moderator. The extraction of positrons from the GaAs substrate into the vacuum through a thin metalization is discussed based upon available positron affinities for the GaAs and various elemental metals. These data suggest that a few monolayers of a strongly electronegative metal such as Au or Pd may allow vacuum emission through quantum tunneling.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF00348229
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  • 2
    Electronic Resource
    Electronic Resource
    The development of an enterprise resources planning system using a hierarchical design pyramid (1998)
    Springer
    Journal of intelligent manufacturing 9 (1998), S. 385-399 
    Details
    ISSN: 1572-8145
    Keywords: Enterprise resources planning ; IDEF ; object-oriented methodoloy ; hierarchical design pyramid
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Notes: Abstract Today, manufacturers are measured by their ability to respond quickly to sudden, often unpredictable changes in customer needs and wants. Competition beyond the twenty-first century places an increased emphasis upon receiving business information that is accurate and up to date. In order to achieve this, a business planning and closed-loop manufacturing execution system must reflect how work is done, in order to support the overall business objectives without being limited by any hardware, software and human resource constraints. Enterprise resources planning (ERP) is considered to be the most effective computer application in the modern manufacturing industry which meets these requirements. However, only a few manufacturers can design and implement the system successfully. They encounter various problems during the design and implementation cycle. One of the major reasons why they cannot implement the system successfully is the inappropriate use of design and implementation methodology. A systematic design and implementation methodology is therefore proposed for ERP. Called the hierarchical design pyramid (HDP), it encompasses recent research on the ICAM definition method (IDEF) and the object-oriented methodology (OOM) as well as an architecture for any manufacturers who seriously consider ERP implementation.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1023/A:1026409806874
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