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  • 72.20  (1)
  • Laser systems and laser beam applications  (1)
  • 1
    Electronic Resource
    Electronic Resource
    Springer
    Il nuovo cimento della Società Italiana di Fisica 4 (1984), S. 435-443 
    ISSN: 0392-6737
    Keywords: Laser systems and laser beam applications
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Description / Table of Contents: Riassunto La transizione amorfo-cristallo in GaAs impiantato è stata ottenuta mediante impulsi laser di potenza a λ=1.06 μm. La fusione dello strato superficiale è possibile in quanto lo strato amorfo è caratterizzato da un valore del coefficiente di assorbimento grande rispetto al materiale cristallino. I valori di soglia misurati sono di 0.8 J/cm2 per cristalli impiantati sia con 50 keV di Te che con 100 keV di Ar. Misure effettuate mediante incanalamento di ioni He+ da 2.0 MeV e spettroscopia dei fotoelettroni emessi a seguito d'irraggiamento con raggi X indicano che non vi è decomposizione apprezzabile a densità di energia prossime alla soglia. Per densità di energia molto piú alte del valore di soglia si osserva invece decomposizione superficiale e perdita di arsenico.
    Abstract: Резюме Исследуется переход аморфного состояния в монокристаллическое, индуцированный мощным импульсом неодимового лазера, в GaAs, имплантированном ионами, используя высокий козффициент поглощения в аморфных материалах. Плотность пороговой энергии составляет 0.8 Дж/см2 для внедренных ионов Te+ с энергией 50 кэВ и ионов Ar+ с энергией 100 кэВ. Эффект каналирования и техника рентгеновской фотоэлектронной спектроскопии указывают, что в узком окне плотности энергии немного выше порога не возникает заметного уменьщения As. Высокие плотности энергии вызывают потери Аз вблизи поверхностой области.
    Notes: Summary The amorphous-to-single crystal transition induced by high-power Nd laser pulse has been studied in ion-implanted GaAs by taking advantage of the high-absorption coefficient of amorphous material. A threshold energy density of about 0.8 J/cm2 has been measured for both 50 keV Te+ and 100 Ar+ implants. Channelling effect and X-ray photoelectron spectroscopy techniques indicate that no appreciable As loss occurs in a narrow energy density window just above threshold. High-energy densities cause instead As loss from the near surface region.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Springer
    Applied physics 33 (1984), S. 107-111 
    ISSN: 1432-0630
    Keywords: 72.20 ; 79.20 ; 81
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract The transmitted energy density in thin single Si crystal, wafers is measured atλ=1.06 μm as a function of the incident energy density for a Nd laser pulse of 30 ns duration. Non-linear effects begin to become important at about 0.3 J/cm2. The contribution due to free-carriers is separated from the interband one by using measurements made at low energy density and at different sample temperatures in the 20°–150 °C range. The time dependence of the free-carrier concentration and of the lattice temperature is computed for different values of the Auger constant. The experimental data in the 0.2–2.5 J/cm2 energy density range are fitted with an Auger constant of 10−30 cm6s−1.
    Type of Medium: Electronic Resource
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