ISSN:
1432-0630
Keywords:
61.80.x
;
68.20.-s
;
61.16.-d
;
42.50.Qm
Source:
Springer Online Journal Archives 1860-2000
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
,
Physics
Notes:
Abstract Transition to single crystal of polycrystalline Si material underlying a Si crystal substrate of 〈100〉 orientation was obtained via laser irradiation. The changes in the structure were analyzed by reflection high energy electron diffraction and by channeling effect technique using 2.0 MeV He Rutherford scattering. The power density required to induce the transition in a 4500 Å thick polycrystalline layer is about 70 MW/cm2 (50ns). The corresponding amorphous to single transition has a threshold of about 45 MW/cm2.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1007/BF00885039
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