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  • Polymer and Materials Science  (1)
  • 2015-2019
  • 1975-1979  (1)
  • 1
    Electronic Resource
    Electronic Resource
    New York, NY [u.a.] : Wiley-Blackwell
    Journal of Applied Polymer Science 23 (1979), S. 2627-2637 
    ISSN: 0021-8995
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: The plasma polymerization of C2F4 was carried out in both continuous wave and pulsed rf discharges to establish the effects of reaction conditions on the kinetics of polymer deposition and the polymer structure. ESCA spectra of the polymer show evidence for —CF3, —CF2, and —CH2— groups. Under conditions favoring low deposition rates, the dominant functional group is —CF2—. At higher deposition rates the concentration of —CF2— groups is reduced and a more crosslinked polymer is produced. Both polymer deposition rates and polymer structures were essentially identical when using continuous wave and pulsed rf discharges.
    Additional Material: 14 Ill.
    Type of Medium: Electronic Resource
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