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  • 1
    Electronic Resource
    Electronic Resource
    X-ray grazing incidence diffraction from alkylsiloxane monolayers on silicon wafers (1991)
    College Park, Md. : American Institute of Physics (AIP)
    The Journal of Chemical Physics 95 (1991), S. 2854-2861 
    Details
    ISSN: 1089-7690
    Source: AIP Digital Archive
    Topics: Physics , Chemistry and Pharmacology
    Notes: X-ray reflection (both specular and off-specular) and grazing incidence diffraction (GID) have been used to study the structure of alkylsiloxane monolayers (n-C18H37SiO1.5) formed by self-assembly from solution on silicon wafers. GID studies of complete monolayers reveal a single ring of scattering associated with the monolayer. The Lorentzian line shape of this ring indicates that the film is characterized by liquidlike order, with a typical translational correlation length of about 45 A(ring). The thermal coefficient of expansion of the monolayer, as determined from the GID peak position, is approximately equal to the value for liquid n-alkanes. Upon either heating or cooling, the monolayer correlation lengths decrease, suggesting that the differential thermal-expansion coefficients of the film and substrate figure prominently in thermal changes of the molecular ordering. GID data for incomplete monolayers also reveal a single ring of scattering associated with the monolayer. While both the translational correlation lengths and integrated peak areas are significantly reduced relative to complete monolayers, the peak positions of the incomplete monolayers are comparable to those of complete monolayers. Given the lower average areal density of incomplete monolayers, this finding implies that incomplete monolayers are inhomogeneous.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.460886
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  • 2
    Electronic Resource
    Electronic Resource
    Thermally actuated interferometric sensors based on the thermal expansion of transparent elastomeric media (1999)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 70 (1999), S. 2031-2037 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: In this article the fabrication and characterization of two thermally actuated optical devices for the measurement of temperature and power are described. A transparent polymer having a high coefficient of thermal expansion—poly(dimethylsiloxane) (PDMS)—was used as the temperature-sensitive medium. Changes in the dimensions of the polymer on heating caused the observed optical responses of both devices. The temperature sensor based on the Fabry–Pérot cavity measures temperature differences to a precision of 0.005 °C within the linear working ranges of the device. The power sensor uses the architecture of a Mach–Zender interferometer; it is suitable for measurements of powers in the mW/cm2 range, delivered optically to the surface of the device in the visible wavelength region. The devices are inexpensive, easy to fabricate, and mechanically rugged. They offer alternatives to other sensors for measuring temperature and power. © 1999 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1149706
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  • 3
    Electronic Resource
    Electronic Resource
    Elastomeric binary phase gratings for measuring acceleration, displacement, strain, and stress (1996)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 67 (1996), S. 3310-3319 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: This article describes the fabrication and operating principles of a device suitable for measuring displacements, stresses, strains, accelerations, and forces. The device consists of an elastomeric material with a surface relief diffraction grating embossed on its surface. Mechanical compression of this element changes the way that it diffracts light. This article also describes designs and performance characteristics of simple accelerometers and pressure sensors based on these devices. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1147413
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  • 4
    Electronic Resource
    Electronic Resource
    Using an elastomeric phase mask for sub-100 nm photolithography in the optical near field (1997)
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 70 (1997), S. 2658-2660 
    Details
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Bringing an elastomeric phase mask into conformal contact with a layer of photoresist makes it possible to perform photolithography in the near field of the mask. This technique provides an especially simple method for forming features with sizes of 90–100 nm in photoresist: straight lines, curved lines, and posts, on both curved and planar surfaces. It combines experimental convenience, new optical characteristics, and applicability to nonplanar substrates into a new approach to fabrication. Nanowire polarizers for visible light illustrate one application for this technique. © 1997 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.118988
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  • 5
    Electronic Resource
    Electronic Resource
    Improved adhesion of thin conformal organic films to metal surfaces (1986)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 57 (1986), S. 1381-1383 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: A technique is described for attaching thin, conformal, pin-hole-free electrically insulating polyethylene films to flat gold surfaces (previously modified by adsorption of a monolayer of an organic disulfide) by plasma polymerization. These polyethylene films are tough enough to support the attachment of gold electrodes.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1138605
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  • 6
    Electronic Resource
    Electronic Resource
    Features of gold having micrometer to centimeter dimensions can be formed through a combination of stamping with an elastomeric stamp and an alkanethiol "ink'' followed by chemical etching (1993)
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 63 (1993), S. 2002-2004 
    Details
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: This letter describes a technique that can be used to produce well-defined features of gold. The technique involves patterning of a self-assembled monolayer (SAM) on a gold substrate using an elastomer stamp (fabricated either from a phenol-formaldehyde polymer or polydimethylsiloxane), followed by selective etching in an aqueous, basic solution of cyanide ion and dissolved dioxygen (1M KOH, 0.1 M KCN). Electrically conductive structures of gold with dimensions as small as 1 μm have been produced using this procedure. Once a rubber stamp is fabricated, patterning and etching of gold substrates is straightforward. This method is convenient, does not require routine access to clean rooms and photolithographic equipment, and can be used to produce multiple copies of a pattern.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.110628
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  • 7
    Electronic Resource
    Electronic Resource
    Maskless photolithography: Embossed photoresist as its own optical element (1998)
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 73 (1998), S. 2893-2895 
    Details
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: This letter demonstrates that features embossed on the surface of a layer of photoresist can direct UV light in the photoresist layer. These topographical features act as optical elements: they focus/disperse and phase shift incident light in the optical near field, inside the resist layer. A number of different surface topographies have been examined, which give 50–250 nm features after exposure and development. This method gives patterns of complex features over large areas, in a parallel process, that can then be transferred into silicon or metal. It provides a method for controlling the intensity of light inside a thin film of photoresist. © 1998 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.122621
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  • 8
    Electronic Resource
    Electronic Resource
    Using microcontact printing to generate amplitude photomasks on the surfaces of optical fibers: A method for producing in-fiber gratings (1997)
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 70 (1997), S. 7-9 
    Details
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: This letter describes a method for producing in-fiber gratings that reduces the effects of mechanical and optical instabilities limiting other methods. In this technique, opaque lines formed on the outside of the fiber using a procedure known as microcontact printing, serve as an amplitude photomask for exposure to ultraviolet light. Long-period fiber optic attenuators formed by ths technique demonstrate its advantages. © 1997 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.119313
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  • 9
    Electronic Resource
    Electronic Resource
    Selectivities among capillary bonds in mesoscale self-assembly (1999)
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 75 (1999), S. 3222-3224 
    Details
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: This letter describes the capillarity-driven self-assembly of mm-sized plates of poly(dimethylsiloxane) at the perfluorodecalin/H2O interface into complex arrays. The shape of the interacting menisci could be tailored by three strategies: (1) changing the shape of uniformly hydrophobic edges; (2) patterning the distribution of vertical hydrophobic strips on the edges and, in some cases, varying the density of the blocks; and (3) patterning the hydrophobic areas on a face to be chiral. © 1999 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.125284
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  • 10
    Electronic Resource
    Electronic Resource
    Using soft lithography to fabricate GaAs/AlGaAs heterostructure field effect transistors (1997)
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 71 (1997), S. 2020-2022 
    Details
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: This letter describes the fabrication of functional GaAs/AlGaAs field effect transistors using micromolding in capillaries—a representative soft lithographic technique. The fabrication process involved three soft lithographic steps and two registration steps. Room temperature characteristics of these transistors resemble those of field effect transistors fabricated by photolithography. The fabrication of functional microelectronic devices using multilayer soft lithography establishes the compatibility of these techniques with the processing methods used in device fabrication, and opens the door for their development as a technique in this area. © 1997 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.119774
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