ALBERT

All Library Books, journals and Electronic Records Telegrafenberg

X
feed icon rss

Your email was sent successfully. Check your inbox.

An error occurred while sending the email. Please try again.

Proceed reservation?

Export
  • 1
    Electronic Resource
    Electronic Resource
    Edge plasma density reconstruction for fast monoenergetic lithium beam probing (1993)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 64 (1993), S. 1699-1704 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: Two different electron density reconstruction methods for 8-keV neutral lithium beam probing have been developed for the Compact Helical System (CHS). Density dependences on emission and ionization processes are included by using effective rate coefficients obtained from the collisional radiative model. Since the two methods differ in the way the local beam density in the plasma is determined, the methods have different applicable electron densities. The beam attenuation is calculated by iteration from the electron density profile in method I. In method II, the beam remainder at the observation point z is determined by integrating the Li i emission intensity from z toward the position of emission tail-off. At the emission tail-off, the fast lithium beam is completely attenuated. Selecting an appropriate method enables us to obtain edge electron density profile well inside the last closed flux surface for various ranges of plasma densities (1012–5×1013 cm−3). The electron density profiles reconstructed by these two different methods are in good agreement with each other and are consistent with results from ruby laser Thomson scattering.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1143996
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
    Paper (German National Licenses)
    Fulltext
  • 2
    Electronic Resource
    Electronic Resource
    Inductively driven gas-breakdown plasma source for intense ion beam production (1993)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 64 (1993), S. 2737-2745 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: A plasma source based on an inductive breakdown of a supersonic gas puff is described. The source was developed to provide an anode plasma for an annular, extraction geometry, magnetically insulated ion diode. In this source, plasmas with densities of 1013 cm−3 were generated and accelerated to velocities of 20–30 cm/μs; plasma fluxes of 10–40 A/cm2 were obtained. Operating the source under the diode insulating field effect, plasma fluxes above 100 A/cm2 were observed. When the plasma source was used in conjunction with a magnetically insulated diode gap, intense ion beams with proton fluxes of more than 100 A/cm2, energies of 100 keV, and beam pulses longer than 1 μs were extracted.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1144412
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
    Paper (German National Licenses)
    Fulltext
  • 3
    Electronic Resource
    Electronic Resource
    Application of a dc glow discharge source with controlled plasma potential in plasma immersion ion implantation (1999)
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 86 (1999), S. 4821-4824 
    Details
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A dc glow discharge source with controlled plasma potential was developed for application in plasma immersion ion implantation processing of materials surfaces. This type of ion implantation system allows cost effective surface modification of workpieces with complex shapes. The effects of the nitrogen plasma etching during the plasma immersion ion implantation process was studied using Si wafers as monitors, as we varied the externally controlled plasma potential between 0 and 350 V. When the plasma potential is controlled below 70 V, the ion implantation is dominant, otherwise the etching overtakes. The nitrogen implanted silicon wafers were analyzed by high resolution x-ray diffraction and Auger electron spectroscopy which revealed successful implantation of ions with accumulated nitrogen dose of 1.5×1017 cm−2, for the low potential case. © 1999 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.371448
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
    Paper (German National Licenses)
    Fulltext
  • 4
    Electronic Resource
    Electronic Resource
    Magnetically insulated ion diode with a gas-breakdown plasma anode (1988)
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 63 (1988), S. 1872-1876 
    Details
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: An active anode plasma source has been developed for use in a magnetically insulated ion diode operated on a 1010-W pulsed power generator. This source uses an inductive voltage from a single turn coil to beak down an annular gas puff produced by a supersonic nozzle. The resulting plasma is magnetically driven toward the radial insulating magnetic field in the diode accelerating gap and stagnates at a well-defined surface after about 300 ns to form a plasma anode layer defined by magnetic flux surfaces. An ion beam is then extracted from this plasma layer by applying a 150-kV, 1-μs pulse to the accelerating gap. Optimization of the timing of the gas puff, the plasma production discharge, and the high voltage pulse has resulted in 1-μs duration 75–150-keV ion beam pulses with 〉100-A/cm2 peak ion current density over an area of about 400 cm2. Up to 5 J/cm2 has been collected by a 4-cm2 calorimeter. The diode impedance history can be varied so that rising, flat, and falling voltage pulse waveforms can be produced. Streak photographs of beamlets impinging on a scintillator and time integrated targets both show beam divergence angles ≤3°. However, under certain operating conditions, large excursions (∼25°) in mean aiming angle on time scales of 20–200 ns are observed.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.339884
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
    Paper (German National Licenses)
    Fulltext
  • 5
    facet.materialart.
    Unknown
    Electronic structure and magnetic anisotropy of L10-FePt thin film studied by hard x-ray photoemission spectroscopy and first-principles calculations (2016)
    American Institute of Physics (AIP)
    Details
    Publication Date: 2016-07-28
    Description: We have studied the electronic structure of the L 1 0 ordered FePt thin film by hard x-ray photoemission spectroscopy (HAXPES), cluster model, and first-principles calculations to investigate the relationship between the electronic structure and perpendicular magneto-crystalline anisotropy (MCA). The Fe 2 p core-level HAXPES spectrum of the ordered film revealed the strong electron correlation in the Fe 3 d states and the hybridization between the Fe 3 d and Pt 5 d states. By comparing the experimental valence band structure with the theoretical density of states, the strong electron correlation in the Fe 3 d states modifies the valence band electronic structure of the L 1 0 ordered FePt thin film through the Fe 3 d -Pt 5 d hybridization. These results strongly suggest that the strong electron correlation effect in the Fe 3 d states and the Fe 3 d -Pt 5 d hybridization as well as the spin-orbit interaction in the Pt 5 d states play important roles in the perpendicular MCA for L 1 0 -FePt.
    Print ISSN: 0003-6951
    Electronic ISSN: 1077-3118
    Topics: Physics
    Published by American Institute of Physics (AIP)
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
    PAPER CURRENT
  • 6
    facet.materialart.
    Unknown
    Development of steady-state operation using ion cyclotron heating in the Large Helical Device (2014)
    American Institute of Physics (AIP)
    Details
    Publication Date: 2014-06-20
    Description: Using a handshake shape (HAS) antenna phasing dipole for ion cyclotron heating (ICH), the heating efficiency was higher than that using a previous poloidal array antenna in the Large Helical Device. In order to sustain the dipole operation, real-time feedback for impedance matching and maintaining the same phase and power was adopted during long-pulse discharge. The HAS antenna was designed to reduce parasitic losses associated with energetic particle and radio-frequency (RF) sheath effects by field-aligned current concentration on the midplane. Local hot spots and the inhomogeneity of the diverter heat profile in the toroidal direction were reduced. The long-pulse discharge with an electron density ( n e0 ) of 1 × 10 19 m −3 , center electron temperature ( T e0 ) of 2.5 keV, a plasma duration time ( t d ) of 19 min, and RF heating power ( P RF ) of 1 MW was achieved by ICH and electron cyclotron heating.
    Print ISSN: 1070-664X
    Electronic ISSN: 1089-7674
    Topics: Physics
    Published by American Institute of Physics (AIP)
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
    PAPER CURRENT
Close ⊗
This website uses cookies and the analysis tool Matomo. More information can be found here...