ISSN:
1089-7623
Source:
AIP Digital Archive
Topics:
Physics
,
Electrical Engineering, Measurement and Control Technology
Notes:
A broad-beam ion source is developed for ion-beam etching of quartz wafers, which are used in resonators with a high basic frequency of the order of magnitude of 1 GHz. The improvement of uniformity of the extracted ion beam is investigated. The double-grid multiple-aperture ion optics is adopted, in which perveance is matched by varying both the aperture diameters and spaces between grids. The configuration of the magnetic field is optimized. Measured at the target of 12 cm from the grids, the area of uniform region (nonuniformity 〈5%) is approximately equal to the area of the bored region of the grids (12 cm diam) and 1/1.78 of the cross-section area of the anode (16 cm diam). A broad beam of 100–1000 eV and 0.1–2.0 mA/cm2 is extracted from the source to fulfill the requirement of the etching process. Without any cooling system, the ion source is installed in vacuum chamber. © 1996 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.1146799
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