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  • American Institute of Physics (AIP)  (15)
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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 75 (1994), S. 1133-1137 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Intra-4f-shell transitions of Er3+ ions in Ca1−xErxF2+x thin films were studied by means of photoluminescence (PL) and cathodoluminescence (CL) measurements at room temperature. The samples, with x varying from 0.01 to 0.2, were epitaxially grown on Si(100) substrates by sublimation of solid solution powders. Using the 488-nm line of an Ar+-ion laser as the excitation source, it is shown that the films present strong PL lines corresponding to the internal transitions between the 4S3/2,4F9/2,4I11/2, and 4I13/2 excited levels and the 4I15/2 fundamental state of Er3+ (4f11) ions. Their centers of gravity were pointed out at λ=533, 650, 980, and 1530 nm, respectively. These electronic transitions were also evidenced by means of the CL technique. Moreover, this technique showed that the luminescence is uniform in all points of the layers. The PL intensities vary considerably as a function of the erbium substitution rate. In the visible range the strongest luminescence was found for x less than 0.01, while for the 1530-nm line (which presents evident potential applications for optical communications) the highest luminescence intensity corresponds to x close to 0.16. The refractive index (n) of the layers also varies with the erbium concentration. For a 1.3-μm incident radiation, n continuously increases from 1.425 to 1.466 when x varies from 0.035 to 0.19. This result shows that these structures can lead to the realization of plane optical waveguides.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 54 (1989), S. 1238-1240 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Schottky diode has been realized on InP by a special dry surface treatment. The diode reaches a breakdown voltage of 60 V and the reverse current remains at 0.6 μA under 30 V reverse voltage. The best device shows a reverse current of 0.2 nA at 1 V voltage with an ideality factor of 1.54. The Schottky has been used as a gate in the fabrication of field-effect transistors (FETs) on InP by ion implantation and chemical beam epitaxy. The ion-implanted FET with a channel concentration of 2×1017 cm−3 shows a transconductance of 107 mS/mm at room temperature for a 3 μm gate length.
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  • 3
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 52 (1988), S. 540-542 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Schottky contacts with barrier heights of 0.76 eV on n-type InP and 0.65 eV on n-type GaInAs are realized by a new surface treatment. These contacts are used as a gate for the fabrication of field-effect transistors (FET) on these materials. Extrinsic transconductances of 100 and 7.5 mS/mm are measured on GaInAs and InP FET's, respectively. These values are obtained without optimization of the ohmic contacts of the devices and without a gate recess.
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  • 4
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 51 (1987), S. 1597-1599 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: InGaAs epitaxial layers have been doped with beryllium with concentrations ranging from 1016 to 5×1019 cm−3 as measured by secondary ion mass spectroscopy (SIMS). From electrical measurements we have observed that p-type layers presented a high degree of compensation, and for a doping level below 5×10−7 cm−3, they are often found to be n type. SIMS analysis shows that oxygen is responsible for such behavior. Beryllium doping leads to incorporation of a large amount of oxygen in the epitaxial layers. Investigations on the origin of oxygen incorporation show that it is extremely sensitive to the residual vacuum during the growth and can be reduced by decreasing arsenic pressure.
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  • 5
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 51 (1987), S. 1361-1363 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Schottky contact with apparent barrier height of near 0.65 eV has been fabricated and used to perform capacitance-voltage and deep level transient spectroscopy characterizations on n-type molecular beam epitaxy grown GaInAs layers matched to InP substrates. The experimental results show the existence of a residual defect center located at 0.33 eV below the conduction band which is here described for the first time. This defect center is localized close to the surface and the interface of the grown layers. The origin of the center is not clearly understood, but it seems to be a residual defect in which oxygen atom can be involved.
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 73 (1993), S. 1180-1186 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Erbium-substituted Ca1−xErxF2+x calcium trifluoride layers were grown on Si(100) substrates by sublimation under ultrahigh vacuum of high purity solid solution powders. X-ray diffraction and scanning electron microscopy techniques were performed to study the texture and the structure of the layers. Their composition was mainly deduced from Rutherford backscattering of α particles and particle induced x-ray emission. For an erbium substitution rate, x, lower than 0.2, it has been shown that the film compositions are analogous with that of the sintered material and quite homogeneous. A Rutherford backscattering study in channeling conditions showed that heteroepitaxial Ca1−xErxF2+x/Si(100) structures can be grown for a substrate temperature of 550 °C.
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  • 7
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Recent studies related to the p-type doping of GaInAs epilayers, grown by molecular-beam epitaxy, mentioned erratic results concerning the electrical activity of beryllium (Be). This work reports on the secondary-ion mass spectrometry analysis of moderately Be-doped (between 5×1017 and 5×1018 cm−3 ) GaInAs/InP layers. Two of them were n type while they should have been p type. The comparison of Be depth profiles, obtained under either oxygen or cesium primary-ion bombardment, and detailed study of the secondary-ion mass spectra reveals that Be+ secondary-ion useful yields are largely enhanced in n-type samples when using cesium primary ions. Such behavior is attributed to the presence of varying oxygen contents in the samples, as confirmed by quantitative analyses. Comparison of Be and O concentrations indicates that the two elements probably form complexes inside the GaInAs matrix, providing a mechanism for the observed Be electrical inactivity. The use of positive secondary-ion yield enhancement under cesium bombardment is generalized to other elements (magnesium) in other semiconductor materials, in particular to the case of Au-Mn/GaAs ohmic contacts. Once again such ions reveal the presence of oxygen. Paradoxically, BeCs+ or MgCs+ molecular ions are not sensitive to the presence of oxygen. It is hypothesized that MCs+ species are more stable than MO+ . Such a differential effect is very helpful in characterizing the presence of oxygen in semiconductor materials.
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  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 68 (1990), S. 755-759 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Room-temperature scanning photoluminescence (SPL) measurements were performed on Fe-doped semi-insulating InP wafers obtained from various suppliers. It was found that defects and inhomogeneities such as short- and long-range doping striations, dislocations, and subsurface extended defects are associated with specific "signatures'' in SPL images, regardless of the origin of the samples. Because SPL measurements are fast and nondestructive, they appear to be useful for the evaluation of this material.
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  • 9
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 62 (1987), S. 824-827 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: InP device degradations have often been related to the presence in the active layer of gold atoms having migrated from the contacts. We have studied gold thermal diffusion in InP in the temperature range 400–700 °C, using secondary ion mass spectrometry (SIMS). We have pointed out SIMS artifacts and how to avoid them. We have found small values for the diffusion coefficient: 2×10−12 cm2/s at 550 °C. By deep-level transient spectroscopy measurements, gold appeared to behave as a shallow donor, with a level situated at 0.55 eV from the conduction band. Our conclusion is that gold thermal migration from the contact is not the mechanism responsible for the device degradation.
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  • 10
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 58 (1985), S. 1803-1808 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: This paper reports on depth profiles of Mn implants, after annealing, obtained by secondary ion mass spectrometry. Two types of samples implanted with manganese were studied: unintentionally doped n-type (5–10×1015 e cm−3), and n-type S-doped (n=5×1018 e cm−3) substrates. In unintentionally doped substrates it is found that Mn exhibits a well-defined two-species diffusion front as other acceptors: Be, Zn, or Cd. On the contrary in S-doped substrates it does not move. The study of the correlations between the movement of the residual impurities and the implanted Mn atoms, or Zn in a comparative sample, has led us to propose a model based on an interstitial-substitutional reaction involving the impurity sites and taking place in the bulk of the semiconductor.
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