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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 81 (1997), S. 5787-5789 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We investigated the magnetoimpedance (MI) effect for the soft magnetic nanocrystalline Fe74SixB22−xCu1Nb3 (x=4–18) alloys, and also the relationship between the magnetic properties and the MI effect. The annealing temperature dependence of the MI ratio corresponds to that of the permeability of longitudinal direction of the samples. However, the Si concentration dependence of the longitudinal permeability is different from that of the MI ratio. The maximum MI ratio and the highest field sensitivity for the sample with x=16 after annealing at 570 °C for 1 h are 67% and 23%/Oe, respectively. The MI effect is affected by the magnetic uniaxial anisotropy which is along the longitudinal direction of the ribbon samples. © 1997 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 72 (1992), S. 800-802 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: 180 MeV Cu11+ irradiation was done on the c-axis grain oriented Bi2Sr2CaCu2O8 tapes. Irradiation enhanced hysteresis in dc magnetization curves, especially in high magnetic fields. The irreversibility line can be moved to higher field by irradiation. Transport Jc is also enhanced by the irradiation of the small fluences. The irradiation produced large (∼100 nm) and small (∼5 nm) defects. They are effective for flux pinning in Bi2Sr2CaCu2O8.
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  • 3
    Electronic Resource
    Electronic Resource
    College Park, Md. : American Institute of Physics (AIP)
    The Journal of Chemical Physics 95 (1991), S. 5332-5340 
    ISSN: 1089-7690
    Source: AIP Digital Archive
    Topics: Physics , Chemistry and Pharmacology
    Notes: In order to investigate low-energy excitations below 10 meV, inelastic neutron-scattering measurements have been carried out on various organic amorphous polymers at 10 and 50 K and three inorganic glasses at 150 and 295 K. It was found that a broad excitation peak is observed for all amorphous materials in the ω range of 1.5–4.0 meV irrespective of different chemical structures. On the other hand, highly crystalline polyethylene with a degree of crystallinity 0.96 shows no such broad peak, indicating that the low-energy excitation is characteristic of amorphous materials. We have employed an asymmetric double-well potential as a common origin for the low-energy excitation in amorphous materials and analyzed the results of amorphous polyisobutylene to confirm validity of this model and alternatively to determine parameters of the potential. Analysis of the temperature dependence of the inelastic-scattering intensity of the low-energy excitation leads to a concept of phonon-assisted tunneling in the asymmetric double-well potential.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 86 (1999), S. 2300-2306 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: In semiconductor technology, TiN thin film elements can be used as diffusion barrier between a metallic layer and a silicon oxide dielectric. Plasma application during the growth of TiN thin films modifies the microstructure of these films and consequently alters their physical properties. But details of the effect of plasma application on the evolution of the film microstructure and correlations between this evolution and the physical properties are still unclear. To clarify the correlations, the microstructure of a series of TiN thin films, deposited using an organometallic chemical vapor deposition technique combined with plasma treatments has been analyzed by transmission electron microscopy (TEM). The films were obtained by repeated fabrication sequences consisting of limited film growth followed by the application of a N2/H2 gaseous plasma with various powers and duration times and are actually stackings of plasma-treated elementary layers. TEM analysis shows that these films are made of nanocrystallites and that whereas crystallites are randomly oriented when no plasma is applied, short-time plasma treatments induce a tendency to 〈200〉 texture and longer treatments progressively rotate the direction of texture to 〈220〉. © 1999 American Institute of Physics.
    Type of Medium: Electronic Resource
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