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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 70 (1999), S. 3355-3361 
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: We describe a novel variable (cryogenic) temperature near-field scanning optical microscope (VT-NSOM) designed specifically for submicron imaging of materials and devices over a temperature range of 12–300 K. In high vacuum, we cool only the sample stage of the compact NSOM, thereby maintaining a large scan area (35 μm×35 μm) at low temperatures and enabling rapid (∼30 min) temperature changes. With incorporation into an external conventional optical microscope, the VT-NSOM is capable of imaging a single submicron feature over the entire temperature range. We demonstrate the performance of the instrument by examining the photoresponse of threading dislocation defects in relaxed GeSi films. © 1999 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 76 (2000), S. 1294-1296 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Using a near-field scanning optical microscope to perform local photocurrent measurements, we examine the temperature dependence of contrast associated with individual threading dislocations and crosshatch patterns from 12 to 300 K. The observed weak contrast at room temperature and a negative temperature coefficient indicate that the predominant electrical activity comes from shallow centers. This is consistent with intrinsic defects or at most low levels (∼ppb) of contaminants. In addition, the crosshatch contrast displays a long-range variation below 100 K. © 2000 American Institute of Physics.
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 82 (1997), S. 748-755 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: To understand the factors that determine the resolution and contrast in near-field photocurrent (NPC) imaging of electrically active defects on semiconductor surfaces, a two-dimensional carrier diffusion model with a localized generation term is employed. Numerically simulated images of photo-generated carriers are compared with experimental NPC images acquired using a near-field scanning optical microscope (NSOM). Good agreement in image lateral resolution, contrast, and feature sharpness is obtained. It is found that the NPC lateral resolution of dislocation defects is limited not by the minority carrier diffusion length in the defect-free region as previously believed, but rather by either the defect size or the NSOM tip aperture size, whichever is larger. The NPC contrast increases with larger defect size, smaller tip aperture size, longer diffusion length in the defect-free region, and shorter diffusion length inside the defect. By comparing the theoretical results to experimental NPC data, an estimate for the carrier recombination lifetime inside a single defect can also be obtained. © 1997 American Institute of Physics.
    Type of Medium: Electronic Resource
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