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Interface reaction of NiO/NiFe and its influence on magnetic properties (2001)

Yu, G. H. ; Chai, C. L. ; Zhu, F. W. ; [et al.]

Woodbury, NY : American Institute of Physics (AIP)

Applied Physics Letters 78 (2001), S. 1706-1708

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ISSN: 1077-3118

Source: AIP Digital Archive

Topics: Physics

Notes: Ta/NiO/NiFe/Ta multilayers were prepared by rf reactive and dc magnetron sputtering. The exchange coupling field between NiO and NiFe reached 120 Oe. The composition and chemical states at the interface region of NiO/NiFe were studied using the x-ray photoelectron spectroscopy (XPS) and peak decomposition technique. The results show that there are two thermodynamically favorable reactions at NiO/NiFe interface: NiO+Fe=Ni+FeO and 3NiO+2Fe=3Ni+Fe2O3. The thickness of the chemical reaction as estimated by angle-resolved XPS was about 1–1.5 nm. These interface reaction products are magnetic defects, and we believe that the exchange coupling field Hex and the coercivity Hc of NiO/NiFe are affected by these defects. © 2001 American Institute of Physics.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.1343474

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