ISSN:
1089-7623
Source:
AIP Digital Archive
Topics:
Physics
,
Electrical Engineering, Measurement and Control Technology
Notes:
The second generation SUSS XRS-200 stepper will be described. The development of this stepper was based on three years of experience with the first generation SUSS MAX-I steppers operated at the BESSY synchrotron ring in Berlin. These MAX-I steppers have been in use since 1984 in mask, resist, and source research and development. Circuits with sub-0.5-micron feature sizes were produced using the MAX-I. In contrast to the first generation stepper, the XRS-200 is designed for production volumes with fully automatic mask and wafer handling. With the production oriented XRS-200, gap setting is performed optically using a trinocular microscope. After coarse prealignment of each field, the maskholder and wafer chuck are clamped together. Fine alignment of mask to wafer is then performed, and the complete clamped unit is scanned through the horizontal stationary x-ray beam. Because the mask and wafer are scanned, the beamline end window need only be a few millimeters in height. With this design, a thinner end window can be used, thereby maximizing x-ray flux to the mask and wafer. The first of the XRS-200 series has been installed at BESSY. Initial alignment and exposure results will be presented.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.1140811
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