Publication Date:
2020-09-01
Description:
A facile procedure for the synthesis of ultra-fine silicon nanoparticles without the need for a Schlenk vacuum line is presented. The process consists of the production of a (HSiO 1.5 ) n sol–gel precursor based on the polycondensation of low-cost trichlorosilane (HSiCl 3 ), followed by its annealing and etching. The obtained materials were thoroughly characterized after each preparation step by electron microscopy, Fourier transform and Raman spectroscopy, X-ray dispersion spectroscopy, diffraction methods and photoluminescence spectroscopy. The data confirm the formation of ultra-fine silicon nanoparticles with controllable average diameters between 1 and 5 nm depending on the etching time.
Electronic ISSN:
2054-5703
Topics:
Natural Sciences in General
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