ALBERT — All Library Books, journals and Electronic Records Telegrafenberg

Hits per page

hit 1 - 1 | 1 hit

Sorting

Electronic Resource

New photoresists of cyclized butadlene polymers (1977)

Harita, Y. ; Ichikawa, M. ; Harada, K. ; [et al.]

Stamford, Conn. [u.a.] : Wiley-Blackwell

Polymer Engineering and Science 17 (1977), S. 372-376

add to mindlist on the mindlist

Details

ISSN: 0032-3888

Keywords: Chemistry ; Chemical Engineering

Source: Wiley InterScience Backfile Collection 1832-2000

Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics

Notes: A new photoresist composed of cyclized cis-1, 4-polybutadiene has been developed. The resist has much higher sensitivity on exposure to ultraviolet light than the conventional resist from cyclized polyisoprene. This new resist has no resist-flow even at 250°C, and provides high resolution on baking at 200°C. Thermogravimetric analysis showed that the cyclized polybutadiene decomposes at temperature higher than cyclized polyisoprene.

Additional Material: 10 Ill.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1002/pen.760170608

Permalink

	Location	Call Number	Expected	Availability

Others were also interested in ...

Paper (German National Licenses)

Fulltext

hit 1 - 1 | 1 hit