Electronic Resource
[S.l.]
:
American Institute of Physics (AIP)
Journal of Applied Physics
63 (1988), S. 1-10
ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
A discrete, time-dependent energy deposition model is developed and applied to the study of high-energy electron-beam (100 eV–10 MeV) deposition in atomic oxygen. Secondary electron distributions are computed and observed to relax to steady-state results. Characteristic relaxation times are shown. The loss function, mean energies per electron-ion pair production, production efficiencies, and distribution functions are presented for a wide range of energies. The model uses the latest experimental and theoretical cross sections as input.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.340491
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