ISSN:
1089-7623
Source:
AIP Digital Archive
Topics:
Physics
,
Electrical Engineering, Measurement and Control Technology
Notes:
Recently, broad beam ion sources have been widely used for industrial applications. In order to obtain high quality thin films and process large workpieces, more uniform beam current density is needed. This article introduces a 10-cm-diam cusped ion source with good beam current density uniformity for assisted deposition. Its design characteristics and performance are described. The effects of operation parameters of ion source, the magnetic flux density and its distribution, the cathode shape and its location in the discharge chamber, and the configuration of grids on the uniformity of ion beam current density were experimentally investigated. For screen grid voltage of 300 V and beam current of 100 mA, a 0.93 beam current flatness parameter within a beam spot of 200 mm diameter at a distance of 300 mm downstream from the source was obtained.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.1144965
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