Electronic Resource
Woodbury, NY
:
American Institute of Physics (AIP)
Applied Physics Letters
67 (1995), S. 2491-2493
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
This letter reports the experimental evidence of a 2.3 eV blue shift of the plasmon loss lines observed in the x-ray photoelectron spectra of an ultrathin Si layer equivalent to 1.5×1015 at./cm2 deposited onto a randomly oriented Al2O3 single crystal. The plasmon line shifts, which is roughly proportional to the deposited Si(mass)−2/3, are attributed to quantum confinement effects in agreement with electron energy loss measurements performed on nanosized Si particles. © 1995 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.114618
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