ALBERT

All Library Books, journals and Electronic Records Telegrafenberg

feed icon rss

Your email was sent successfully. Check your inbox.

An error occurred while sending the email. Please try again.

Proceed reservation?

Export
  • 1
    Electronic Resource
    Electronic Resource
    s.l. ; Stafa-Zurich, Switzerland
    Materials science forum Vol. 182-184 (Feb. 1995), p. 623-626 
    ISSN: 1662-9752
    Source: Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Type of Medium: Electronic Resource
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
  • 2
    Electronic Resource
    Electronic Resource
    Springer
    Fresenius' journal of analytical chemistry 364 (1999), S. 367-375 
    ISSN: 1432-1130
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology
    Notes: Abstract An overview is given about the new developments in GDMS, both with respect to the glow discharge source as to the coupling with various kinds of mass spectrometers. Moreover, as for every analytical technique, methodological and fundamental research is being carried out to improve the analytical results of GDMS, and some of the new developments in these fields will be discussed as well. Finally, the various analytical applications of GDMS will be presented.
    Type of Medium: Electronic Resource
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
  • 3
    ISSN: 1432-072X
    Keywords: Key words Plasma membrane H+-ATPase ; Saccharomyces cerevisiae ; Low pH ; PMA1 gene expression ; PMA2 gene expression
    Source: Springer Online Journal Archives 1860-2000
    Topics: Biology
    Notes: Abstract Cells of Saccharomyces cerevisiae grown in media with an initial pH of 2.5–6.0, acidified with a strong acid (HCl), exhibited the highest plasma membrane H+-ATPase-specific activity at an initial pH of 6.0. At a lower pH (above pH 2.5) ATPase activity (62–83% of the maximum level) still allowed optimal growth. At pH 2.5, ATPase activity was about 30% of the maximum value and growth was impaired. Quantitative immunoassays showed that the content of ATPase protein in the plasma membrane was similar across the entire pH range tested, although slightly lower at pH 2.5. The decrease of plasma membrane ATPase activity in cells grown at low pH was partially accounted for by its in vitro stability, which decreased sharply at pH below 5.5, although the reduction of activity was far below the values expected from in vitro measurements. Yeast growth under acid stress changed the pattern of gene expression observed at optimal pH. The level of mRNA from the essential plasma-membrane-ATPase-encoding gene PMA1 was reduced by 50% in cells grown at pH 2.5 as compared with cells grown at the optimal pH 5.0, although the content of ATPase in the plasma membrane was only modestly reduced. As observed in response to other kinds of stress, the PMA2 promoter at the optimal pH was up to eightfold more efficient in cells grown at pH 2.5, although it remained several hundred times less efficient than that of the PMA1 gene.
    Type of Medium: Electronic Resource
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 77 (1995), S. 1868-1874 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A three-dimensional Monte Carlo model is developed to simulate the thermalization process of atoms sputtered from the cathode in a glow discharge cell. A comparison is made with a simplified analytical thermalization model and the relative importance of different interaction potentials and scattering assumptions on quantities related to thermalization is investigated. Typical results of the thermalization model are (i) the thermalization profile (which gives the distribution of the thermalized sputtered atoms), (ii) the relative amount of atoms that can reach the backplate of the discharge cell without being thermalized, and (iii) the relative amount of backscattering to the cathode. The influence of gas pressure, kind of gas, and cathode material on the thermalization process is also investigated. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 79 (1996), S. 1279-1286 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The Cu atoms sputtered from the cathode and the corresponding Cu ions in an argon direct current glow discharge are described by a combination of two models: a fluid model for their overall behavior (diffusion and migration) in the entire discharge and a Monte Carlo model for the explicit transport of the Cu ions in the cathode dark space. The models are combined with other models described previously for the electrons, Ar ions, fast Ar atoms, and Ar metastables, in order to obtain an overall picture of the glow discharge. Results of the fluid model are the densities and fluxes of the Cu atoms and ions. At 100 Pa and 1000 V the Cu atom and ion densities are of the order of 1012–1013 and 1010–1011 cm−3, respectively. The ionization degree is hence about 1%, which is much higher than for Ar. The Cu ion to Ar ion density is about 6% and the Cu ion to Ar ion flux is about 5%. The energy distribution of the Cu ions bombarding the cathode is calculated with the Monte Carlo model and shows good agreement with experiment. It is characterized by a peak at maximum energy, in contrast to the energy distribution of Ar ions and fast atoms. Since sputtering increases with the bombarding energy, the amount of self-sputtering is significant, although still clearly lower than the contribution of Ar ions and fast atoms. The influence of pressure, voltage, and current on all these quantities is investigated. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 78 (1995), S. 2233-2241 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A self-consistent hybrid Monte Carlo-fluid model for a direct current glow discharge is presented. The Monte Carlo part simulates the fast electrons while the fluid part describes the ions and slow electrons. Typical results of the model include collision rates of the fast electrons, energy distributions of these electrons, fluxes and densities of the different plasma species, the electric field and the potential distribution, all as a function of position from the cathode. The influence of the negative glow on the calculations in the cathode dark space is studied. Moreover the influence of three-dimensional scattering instead of forward scattering and the incorporation of side wall effects is investigated. Calculations are carried out for a range of voltages and pressures in order to study their influence on the calculated quantities. Comparison was made between total electrical currents calculated in the model and experimentally measured ones to check the validity of the model. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 78 (1995), S. 6427-6431 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A model is developed for a direct-current glow discharge in argon by a combination of a hybrid Monte Carlo fluid model of electrons and ions in the entire discharge and a Monte Carlo model of ions and fast atoms in the cathode dark space, in which fast ion and atom impact ionization are incorporated. The relative importance of these processes, compared to electron impact ionization is investigated, as a function of distance from the cathode and at different discharge conditions. It is found that they are dominant close to the cathode, and that they gain importance with increasing voltages. With the incorporation of these processes it was possible to predict current–voltage relations which are in excellent agreement with experiment. Also, the length of the cathode dark space, as a function of pressure and voltage, is calculated; the results agree with Aston's empirical formula. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 86 (1999), S. 2990-3001 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A hybrid Monte Carlo-fluid model has been developed for the description of electrons, argon ions, and fast argon atoms in a capacitively coupled radio-frequency (rf) glow discharge used in analytical spectroscopy. Typical operating conditions are about 6 Torr pressure and 10 W electrical power. The discharge cell is rather small and is characterized by a much smaller rf-powered electrode than grounded electrode, which yields a high dc bias voltage. The electron density at these conditions is in the order of 1013 cm−3. The computation time to simulate all these electrons with a Monte Carlo or a particle-in-cell method was found to be too long. Therefore, the electrons are subdivided in two groups. The fast electrons emitted from the rf electrode, as well as the ones formed by ionization with sufficiently high total (=kinetic+potential) energy for further ionization, give rise to so-called γ ionization; these are described with a Monte Carlo method. The slow electrons, which can, however, be heated again by the fluctuating electric field, give rise to so-called α ionization; they are described with a fluid approach, which also treats the argon ions. Moreover, the fast argon ions and atoms are treated with a Monte Carlo model in the rf sheath. Typical results of this model include the electrical characteristics (i.e., dc bias and rf amplitude voltages, electrical current, potential, and electric field distributions), the electron densities and mean energies, the ionization rates due to the electron impact α and γ ionization and fast argon ion and atom impact ionization, and the relative contributions of these ionization mechanisms to the overall ionization. © 1999 American Institute of Physics.
    Type of Medium: Electronic Resource
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
  • 9
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 86 (1999), S. 4124-4133 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A two-dimensional model has been developed for calculating the behavior of Ar2+ and Ar2+ ions in a direct current argon glow discharge, by the use of balance equations describing the various production and loss processes for these species, as well as their transport by diffusion and migration. These balance equations are coupled to the equations for the Ar+ ions and electrons and solved simultaneously with Poisson's equation, to obtain a self-consistent description of the charged particles behavior and the electrical characteristics in the glow discharge. Moreover, this model is combined with the other models that we have developed previously for the Ar atoms in various excited levels and the Cu atomic and ionic species, to obtain an overall description of the direct current argon glow discharge. The model is applied to typical conditions used for glow discharge mass spectrometry (pressure of 50–100 Pa, voltage of 600–1400 V, and current of 0.4–15 mA). Typical calculation results include the densities and fluxes of these ionic species, as well as the relative contributions of their production and loss processes. The Ar2+ ions are almost exclusively formed by two-electron ionization from Ar0 atoms, and they become primarily lost by diffusion and subsequent recombination at the cell walls. The Ar2+ ions are mainly created by Hornbeck–Molnar and metastable-metastable associative ionization, whereas atom to molecule conversion seems to play only a minor role at the discharge conditions under study. Loss of these Ar2+ ions is caused primarily by diffusion and recombination at the cell walls, but dissociative recombination in the plasma plays also a significant role. We found that the ratios of Ar2+/Ar+ and Ar2+/Ar+ ion densities and fluxes were in the order of 1%–10%, which is in good agreement with experimental observations. © 1999 American Institute of Physics.
    Type of Medium: Electronic Resource
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
  • 10
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 84 (1998), S. 121-136 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: An extensive collisional-radiative model for the argon atoms in a glow discharge has been developed. Sixty-five effective argon atomic levels are considered. The processes taken into account are radiative decay, electron, fast argon ion and argon atom and thermal argon atom impact ionization, excitation and deexcitation between all the levels, electron-ion radiative recombination, and electron-ion three-body recombination where the third body is an electron, fast argon ion or atom, or a thermal argon atom. Some additional processes are incorporated for the two 4s metastable levels, i.e., Penning ionization of sputtered atoms, two- and three-body collisions with argon ground state atoms, collisions between two atoms in a metastable level, and diffusion and subsequent deexcitation at the walls. Typical results of the model are the populations of the various excited levels as a function of distance, and the relative contributions of different populating and depopulating processes for all levels. © 1998 American Institute of Physics.
    Type of Medium: Electronic Resource
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
Close ⊗
This website uses cookies and the analysis tool Matomo. More information can be found here...