Publication Date:
2012-09-06
Description:
Author(s): Kevin A. McDonnell, Niall J. English, Mahfujur Rahman, and Denis P. Dowling Titanium dioxide (TiO 2 ) thin films, doped with chromium (Cr) and codoped with chromium-carbon (Cr, C) and chromium-nitrogen (Cr, N) of various concentrations, were deposited using magnetron sputtering. Postdeposition thermal treatments were carried out at 450 °C for 5 h to change the as-deposited am... [Phys. Rev. B 86, 115306] Published Wed Sep 05, 2012
Keywords:
Semiconductors II: surfaces, interfaces, microstructures, and related topics
Print ISSN:
1098-0121
Electronic ISSN:
1095-3795
Topics:
Physics
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