Electronic Resource
[S.l.]
:
American Institute of Physics (AIP)
Journal of Applied Physics
62 (1987), S. 1054-1058
ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
We have studied the first stages of low-pressure oxidation of amorphous silicon using Auger electron spectroscopy. The application of the principal component analysis to the Si L2,3 core-valence-valence transition spectra, acquired during the oxidation, allows us for the interpretation of the oxidation kinetics of the a-Si. Using the target transformation method we have isolated the Auger spectra of the components present during the oxidation process. We observe an intermediate state in the Si-SiO2 interface formed during the oxidation. This state was attributed to a SiOx-type compound.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.339763
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