ISSN:
0032-3888
Schlagwort(e):
Chemistry
;
Chemical Engineering
Quelle:
Wiley InterScience Backfile Collection 1832-2000
Thema:
Chemie und Pharmazie
,
Maschinenbau
,
Physik
Notizen:
A new photoresist composed of cyclized cis-1, 4-polybutadiene has been developed. The resist has much higher sensitivity on exposure to ultraviolet light than the conventional resist from cyclized polyisoprene. This new resist has no resist-flow even at 250°C, and provides high resolution on baking at 200°C. Thermogravimetric analysis showed that the cyclized polybutadiene decomposes at temperature higher than cyclized polyisoprene.
Zusätzliches Material:
10 Ill.
Materialart:
Digitale Medien
URL:
http://dx.doi.org/10.1002/pen.760170608
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