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Stress control of plasma enhanced chemical vapor deposited silicon oxide film from tetraethoxysilane (2013)

Guan, D ; Bruccoleri, A R ; Heilmann, R K ; [et al.]

Institute of Physics

In: Journal of Micromechanics and Microengineering. 2013; 24(2): 027001. Published 2013 Dec 23. doi: 10.1088/0960-1317/24/2/027001.

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Publication Date: 2013-12-23

Print ISSN: 0960-1317

Electronic ISSN: 1361-6439

Topics: Electrical Engineering, Measurement and Control Technology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics

Published by Institute of Physics

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