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  • 1
    Electronic Resource
    Electronic Resource
    Enhanced ion charge states in vacuum arc plasmas using a "current spike" method : The 8th international conference on ion sources (2000)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 71 (2000), S. 701-703 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: Ion charge state distributions of vacuum arc ion sources are correlated to the arc operating voltage. An enhancement of ion charge state via an increase of the arc voltage can be achieved utilizing the transient processes that accompany an arc current spike. A current spike of 100–1000 A and several microseconds width was produced on top of the main arc current pulse (100 A, 250 μs). The ion charge state distribution was measured by charge-to-mass spectrometry. The measured charge state distributions were used as input data to the plasma model of partial local Saha equilibrium, giving the time-dependent electron temperature of the plasma at the freezing zone near the cathode spot. © 2000 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1150266
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  • 2
    Electronic Resource
    Electronic Resource
    Further development of a gaseous ion source based on low-pressure hollow cathode glow : The 8th international conference on ion sources (2000)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 71 (2000), S. 728-730 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: The gaseous ion source based on a hollow cathode glow discharge with additional external injection of electron beam described in a previous publication has undergone further development. The direction of the source upgrade was to increase the total beam current and its density keeping the same broad beam cross section (about 100 cm2). With an operating gas pressure of 10−4 Torr, the maximum stable discharge current was as high as 40 A in 300 μs (pulsed mode) and about 10 A (dc mode) without discharge gap arc breakdown. The total ion emission current exceeded 1 A in both cases. The geometry of the discharge gap was optimized, allowing improvement of the parameters of the device. The composition of the ion beam under various operating conditions of the discharge has been measured using the time-of-flight method. The electron beam injection into the hollow cathode of the ion source resulted in a reduction of the discharge voltage from the usual 500–600 V to 100 V or less. This lead to lower sputtering and as a result low contamination of the gaseous ion beam by metal fractions. Measurements showed 0.15% metal content instead of the typical several percent. The influence of the ion beam extraction on the discharge parameters was also examined. © 2000 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1150275
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  • 3
    Electronic Resource
    Electronic Resource
    Vacuum arc trigger systems based on E×B discharges (1996)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 67 (1996), S. 3095-3098 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: Triggering systems for vacuum arc plasma sources and ion sources have been developed that make use of a gaseous trigger discharge in a strong magnetic field. Two kinds of trigger discharge configurations have been explored, a Penning discharge and a magnetron discharge. The approach works reliably for low gas pressure in the vacuum arc environment and for long periods of operation between required maintenance: pressures in the mid-10−6 Torr range and for (approximately-greater-than)106 pulses. © 1996 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1147434
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  • 4
    Electronic Resource
    Electronic Resource
    The 100-kV gas and metal ion source for high current ion implantation : Proceedings of the fourth International Conference on Ion Sources (1992)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 63 (1992), S. 2422-2424 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: The TITAN ion source is a new kind of source which can produce high current beams of both metal and gas ions simultaneously or separately. Ion beams of the elements Mg, Al, Ti, Ca, Cr, Fe, Co, Ni, Zn, Sn, Ta, Re, Y, C, He, N, Ar, and Xe have been generated. To obtain metal ions a vacuum arc is used in metal vapors created in "cathode spots.'' To obtain gas ions a contragated arc discharge in gas current is used. The source extraction voltage is controlled within 10–100 kV. The ion current of both gas and metal was (approximately-equal-to)1 A. The source operates in a frequency-pulse regime at a pulse-repetition frequency as high as 50 pps. At its normal operation the source provides a dose of 1016 ions/cm2 per minute on a 250-cm2 area surface. The source is constructed according to the program on development of new technologies and is intended for high current surface modification and production of exotic surface alloys. At present, TITAN ion sources are utilized to modify physical-mechanical parameters of different surfaces. Here we outline the ion source and its performance.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1143827
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  • 5
    Electronic Resource
    Electronic Resource
    The "TITAN'' ion source (1994)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 65 (1994), S. 3119-3125 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: TITAN is a new type of ion source capable of generating high current, wide aperture beams of gas and metal ions from a broad range of elements: Mg, Al, Ti, Cr, Fe, Co, Ni, Sm, Zn, W, Pb, Ta, Re, Y, C, He, N, Ar, and Xe. A specific feature of the TITAN ion source is the use of two kinds of arc discharges, each with cold cathodes, to produce plasma for ion beam extraction. Metal ions are generated by means of the vacuum arc in the metal vapor formed in cathode spots. Gas ions, on the other hand, are provided by a low-pressure constricted arc discharge. In a pulsed mode of operation the extraction voltage of the source ranges from 10 to 100 kV. The pulsed beam current for gas and metal ions is on the order of 1 A at pulse repetition rates up to 50 pulses per second and pulse duration of ∼400 μs. For dc operation and at an extraction voltage up to 10 kV, the ion current is as high as hundreds of milliamperes. This work outlines briefly the ion source, its design, and certain physical peculiarities observed when a high current ion beam is generated and transported.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1144765
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  • 6
    Electronic Resource
    Electronic Resource
    Ion emission from arc discharge plasmas (1994)
    Springer
    Russian physics journal 37 (1994), S. 222-229 
    Details
    ISSN: 1573-9228
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Notes: Abstract Results are presented from studies of the ion-emission properties of the anode plasmas of low-pressure contracted arc discharges and vacuum arcs. It is shown that creating a longitudinal magnetic field in the anode region of a discharge changes the plasma parameters significantly and facilitates a large increase in the ion current. Space charge limited ion current in a vacuum arc leads to a reduction in the noise level of the total ion current and of its components with charges of up to +3, while creating Penning discharge conditions ensures that ions of different gases can be generated in this discharge system at fractions as high as 90%, depending on the type of plasma forming gas.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF00565733
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  • 7
    Electronic Resource
    Electronic Resource
    “Titan,” a source of gas and metal ions based on a contracted discharge and vacuum arc (1994)
    Springer
    Russian physics journal 37 (1994), S. 245-254 
    Details
    ISSN: 1573-9228
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Notes: Abstract “Titan” ion sources are capable of generating wide aperture beams of both gas and metal ions of different types: Mg, Al, Ti, Cu, Cr, Fe, Co, Ni, Sm, Zn, W, Pb, Ta, Re, Y, C, He, N, Ar, Xe. This is made possible by combining two types of cold cathode arc discharges in the discharge system. Metal ions are obtained using a vacuum arc ignited between a cathode made of the ion-forming material and a hollow anode. Gas ions are obtained using a low-pressure contracted arc discharge ignited on the same hollow anode. In pulsed operation the accelerating voltage of the source is regulated from 10 to 100 kV. The pulse current of both gas and metal ions is 0.3–0.5 A with a pulse duration of approximately 400 µs and a pulse repetition rate of up to 50 Hz. During continuous operation at an accelerating voltage as high as 10 kV, the ion current reaches tens of milliamperes. In this article the operating principle of the source is discussed, along with some physical peculiarities which arise during the formation and transport of high-current ions beams, and the design of the ion source is presented.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF00565735
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  • 8
    Electronic Resource
    Electronic Resource
    Effect of residual gas on the ion charge distribution in vacuum arc discharge plasmas (1998)
    Springer
    Technical physics 43 (1998), S. 1031-1034 
    Details
    ISSN: 1090-6525
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Notes: Abstract A magnetic mass analyzer and time-of-flight mass spectrometer are used to study the effect of the pressure and type of residual gas on the ion charge distribution in the plasma of an arc discharge with a cathode spot. The possibility of ionizing a substantial fraction of the gas atoms in this type of discharge is pointed out.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1134/1.1259125
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  • 9
    Electronic Resource
    Electronic Resource
    Charge-state distribution of ions in a vacuum arc discharge plasma in a high magnetic field (1998)
    Springer
    Technical physics 43 (1998), S. 514-517 
    Details
    ISSN: 1090-6525
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Notes: Abstract It is shown that the fraction of multiply charged metal ions generated in a vacuum arc discharge plasma grows substantially in a high magnetic field. This effect was observed for more than 30 different cathode materials. A relation is established between growth of the mean charge of the ions and increases in the burning voltage of the arc. It is demonstrated that the burning voltage of the vacuum arc can be ultimately increased to 160 V.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1134/1.1259030
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  • 10
    Electronic Resource
    Electronic Resource
    Non-self-sustained hollow-cathode glow discharge for large-aperture ion sources (1997)
    Springer
    Technical physics 42 (1997), S. 611-614 
    Details
    ISSN: 1090-6525
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Notes: Abstract A discharge system is proposed in which an auxiliary gas discharge is used to inject electrons into the cathode cavity of a hollow-cathode glow discharge. A study is made of the region of stable existence of a non-self-sustaining hollow-cathode discharge. It is shown that the injection of electrons permits a reduction to 〈10−2 Pa in the minimum pressure at which a discharge can exist. It is shown experimentally that this discharge can be used to generate wide-aperture ion beams.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1134/1.1258586
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