ISSN:
0032-3888
Keywords:
Chemistry
;
Chemical Engineering
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Chemistry and Pharmacology
,
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
,
Physics
Notes:
Conducting polyaniline is found to be suitable for several lithographic applications. With the use of onium salts, polyaniline is made radiation sensitive and shown to be a high resolution conducting photo and electron-beam resist. Conducting lines of 0.25 μm have been patterned with e-beam irradiation. Thin films of conducting polyaniline are found to be effective discharge layers for e-beam lithography. Insulating resist systems charge during e-beam exposure, which results in pattern displacements. When polyaniline is used as a conducting layer below the imaging resist, no pattern displacements are observed. Polyaniline is also shown to eliminate charging during the high resolution inspection and dimensional measurements of X-ray and optical masks by scanning electron microscopy (SEM) when used as a coating on top of the mask. In addition, polyaniline can be used for electrolytic and electroless type metallization processes.
Additional Material:
8 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/pen.760322016
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